0000000000182644
AUTHOR
S. X. Peng
Radiofrequency and 2.45 GHz electron cyclotron resonance H− volume production ion sources
The volume production of negative hydrogen ions (H-) in plasma ion sources is based on dissociative electron attachment (DEA)to rovibrationally excited hydrogen molecules(H2), which is a two-step process requiring both, hot electrons for ionization, and vibrational excitation of the H2 and cold electrons for the H- formation through DEA. Traditionally H- ion sources relying on the volume production have been tandem-type arc discharge sources equipped with biased filament cathodes sustaining the plasma by thermionic electron emission and with a magnetic filter separating the main discharge from the H- formation volume. The main motivation to develop ion sources based on radiofrequency (RF) o…
Radiofrequency and 2.45 GHz electron cyclotron resonance H−volume production ion sources
The volume production of negative hydrogen ions () in plasma ion sources is based on dissociative electron attachment (DEA) to rovibrationally excited hydrogen molecules (H2), which is a two-step process requiring both, hot electrons for ionization, and vibrational excitation of the H2 and cold electrons for the formation through DEA. Traditionally ion sources relying on the volume production have been tandem-type arc discharge sources equipped with biased filament cathodes sustaining the plasma by thermionic electron emission and with a magnetic filter separating the main discharge from the formation volume. The main motivation to develop ion sources based on radiofrequency (RF) or electro…