0000000000326679

AUTHOR

A. Boughelout

Photocatalysis of rhodamine B and methyl orange degradation under solar light on ZnO and Cu2O thin films

We report the photocatalytic properties of ZnO and Cu2O thin films deposited on glass substrates at room temperature by DC sputtering and pulsed laser deposition. The photoactivity of the films was investigated through the degradation of rhodamine B (RhB) and methyl orange (MO) under solar light. In order to select the most suitable film of ZnO for the of RhB and MO degradation, the relationship between the characteristics (e.g. energy levels and defects concentration) of ZnO films and their effectiveness in the photocatalytic yield of RhB and MO been studied, where several films were deposited by using different oxygen partial pressures (PO2: 0.05–1.3 mbar), while Cu2O films were grown und…

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Improved Cu2O/AZO Heterojunction by Inserting a Thin ZnO Interlayer Grown by Pulsed Laser Deposition

Cu2O/ZnO:Al (AZO) and Cu2O/ZnO/AZO heterojunctions have been deposited on glass substrates by a unique three-step pulsed laser deposition process. The structural, optical, and electrical properties of the oxide films were investigated before their implementation in the final device. X-ray diffraction analysis indicated that the materials were highly crystallized along the c-axis. All films were highly transparent in the visible region with enhanced electrical properties. Atomic force and scanning electron microscopies showed that the insertion of a ZnO layer between the Cu2O and AZO films in the heterojunction enhanced the average grain size and surface roughness. The heterojunctions exhibi…

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Rhodamine (B) photocatalysis under solar light on high crystalline ZnO films grown by home-made DC sputtering

Abstract ZnO thin films were deposited by home-made DC sputtering of zinc target under mixed gases (Argon, Oxygen) plasma on glass substrates. Films were deposited by varying oxygen partial pressure (PO2) from 0.09 to 1.3 mbar in the deposition chamber, at a fixed substrate temperature of 100 °C. The samples were characterized by photoluminescence (PL), X-ray diffraction (XRD), optical transmissions (UV–vis), scanning electron microscopy (SEM) and electrical (Hall effect) measurements. The results indicate that by varying the oxygen pressure in the deposition chamber, the films show a precise and well defined photoluminescence emissions for each range of pressure covering almost the entire …

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