0000000000451401
AUTHOR
Stanislav Haviar
Growth of nano-porous Pt-doped cerium oxide thin films on glassy carbon substrate
Abstract Glassy carbon (GC) substrates were treated by the oxygen plasma over several periods of time. Scanning electron microscopy (SEM), transmission electron microscopy (TEM) and atomic force microscopy (AFM) study showed the dramatic influence of oxygen plasma on the morphology of glassy carbon. The treatment leads to the formation of nanostructured surface, which consists of well separated rod-like nanostructures oriented perpendicularly to the substrate surface. The surface roughness was found to increase with increasing treatment time. By using magnetron co-sputtering of platinum and cerium oxide we can prepare oxide layers continuously doped with Pt atoms during the growth. This tec…
Preparation of magnetron sputtered thin cerium oxide films with a large surface on silicon substrates using carbonaceous interlayers.
The study focuses on preparation of thin cerium oxide films with a porous structure prepared by rf magnetron sputtering on a silicon wafer substrate using amorphous carbon (a-C) and nitrogenated amorphous carbon films (CNx) as an interlayer. We show that the structure and morphology of the deposited layers depend on the oxygen concentration in working gas used for cerium oxide deposition. Considerable erosion of the carbonaceous interlayer accompanied by the formation of highly porous carbon/cerium oxide bilayer systems is reported. Etching of the carbon interlayer with oxygen species occurring simultaneously with cerium oxide film growth is considered to be the driving force for this effec…