0000000000626265
AUTHOR
Michael Tkadletz
showing 3 related works from this author
Evolution of the microstructure of sputter deposited TaAlON thin films with increasing oxygen partial pressure
2021
Recently, quaternary oxynitrides of transition metals and aluminum have attracted increasing interest due to their tunable properties. Within the present work, a series of TaAl(O)N films was sputter deposited using constant nitrogen and varying oxygen partial pressures. The films were grown from single element Ta and Al targets. The deposition parameters were adjusted to obtain a Ta/Al atomic ratio of ~50/50 for the oxygen-free film and were held constant for the following depositions, with the exception of the increasing oxygen partial pressure and compensatory decreasing argon partial pressure. Elastic recoil detection analysis revealed oxygen contents of up to ~26 at.%, while the nitroge…
Evolution of the microstructure of sputter deposited TaAlON thin films with increasing oxygen partial pressure
2021
Abstract Recently, quaternary oxynitrides of transition metals and aluminum have attracted increasing interest due to their tunable properties. Within the present work, a series of TaAl(O)N films was sputter deposited using constant nitrogen and varying oxygen partial pressures. The films were grown from single element Ta and Al targets. The deposition parameters were adjusted to obtain a Ta/Al atomic ratio of ~50/50 for the oxygen-free film and were held constant for the following depositions, with the exception of the increasing oxygen partial pressure and compensatory decreasing argon partial pressure. Elastic recoil detection analysis revealed oxygen contents of up to ~26 at.%, while th…
Influence of B content on microstructure, phase composition and mechanical properties of CVD Ti(B,N) coatings
2022
Within this work the effect of the B content on the microstructure, phase composition and mechanical properties of CVD Ti(B,N) coatings is investigated. Ti(B,N) coatings with B contents from 0 (fcc-TiN) to ∼5, ∼15, ∼30, ∼45 and 66 (h-TiB2) at.% have been deposited by CVD. The elemental composition of the coatings was confirmed by ERDA and their microstructure was investigated using XRD and SEM. With increasing B content, a transition from a fcc to a h-dominated structure via dual-phase fcc/h-Ti(B,N) was observed, which was accompanied by a decreasing grain size from the µm to nm range. Combinatorial use of Raman spectroscopy, XPS and APT measurements indicated B-rich grain boundary segregat…