On-line Mössbauer measurements at low temperatures of 83mKr implanted into Al

Abstract A vacuum ion implantation chamber housing a helium flow cryostat and a Mossbauer transducer has been constructed and coupled directly to an ion separator for low temperature implantation and on-line Mossbauer measurements. 83m Kr, produced by thermal neutron activation of enriched 82 Kr gas, has been implanted into Al foils in the temperature range 15–300 K. Annealing effects and the temperature dependence of the Lamb-Mossbauer factor have been studied by Mossbauer measurements (at 15–35 K) using the implanted Al targets as sources and Kr/hydrochinone as absorber.