6533b7d0fe1ef96bd125ac64
RESEARCH PRODUCT
Effect of the Mo atom flow on the molybdenum growth on TiO2 (110) surface
Marie-josé CasanoveVirginie Blondeau-patissierBruno DomenichiniSylvie BourgeoisG.d. Liansubject
Analytical chemistrychemistry.chemical_elementCondensed Matter PhysicsAmorphous solidInorganic ChemistrychemistryX-ray photoelectron spectroscopyTransition metalMolybdenumTransmission electron microscopyMonolayerMaterials ChemistryDeposition (chemistry)Stoichiometrydescription
Abstract Molybdenum has been deposited at room temperature on stoichiometric TiO 2 (1 1 0) surfaces with two deposition rates: 0.1 equivalent monolayer (eqML) and 1.5 eqML min −1 . X-ray photoelectron spectroscopy and high-resolution transmission electron microscopy studies clearly reveal an effect of the deposition rate upon the growth mode and the interfacial reaction. Indeed, whereas a strong interfacial reaction between Mo and TiO 2 involves a Stranski–Krastanov growth mode with the formation of amorphous molybdenum oxide monolayers for the lowest deposition rate, no reaction can be observed for the highest deposition rate. Moreover in this latter case, the growth mode seems to be a 3D one. These differences are discussed from a pure kinetics point of view.
| year | journal | country | edition | language |
|---|---|---|---|---|
| 2004-03-01 | Journal of Crystal Growth |