6533b7d1fe1ef96bd125baf5
RESEARCH PRODUCT
Negative differential resistance in carbon nanotube field-effect transistors with patterned gate oxide.
Andreas JohanssonPäivi TörmäMarcus RinkiöMarcus RinkiöVille Kotimäkisubject
NanostructureMaterials scienceTransistors ElectronicMacromolecular SubstancesSurface PropertiesMolecular ConformationGeneral Physics and AstronomyNanotechnologyCarbon nanotubelaw.inventionComputer Science::Emerging TechnologiesGate oxidelawMaterials TestingElectric ImpedanceNanotechnologyGeneral Materials ScienceParticle SizeTransistorGeneral EngineeringOxidesEquipment DesignCondensed Matter::Mesoscopic Systems and Quantum Hall EffectNanostructuresEquipment Failure AnalysisHysteresisQuantum dotField-effect transistorCrystallizationVoltagedescription
We demonstrate controllable and gate-tunable negative differential resistance in carbon nanotube field-effect transistors, at room temperature and at 4.2 K. This is achieved by effectively creating quantum dots along the carbon nanotube channel by patterning the underlying, high-kappa gate oxide. The negative differential resistance feature can be modulated by both the gate and the drain-source voltage, which leads to more than 20% change of the current peak-to-valley ratio. Our approach is fully scalable and opens up a possibility for a new class of nanoscale electronic devices using negative differential resistance in their operation.
year | journal | country | edition | language |
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2010-06-04 | ACS nano |