6533b7d1fe1ef96bd125baf5

RESEARCH PRODUCT

Negative differential resistance in carbon nanotube field-effect transistors with patterned gate oxide.

Andreas JohanssonPäivi TörmäMarcus RinkiöMarcus RinkiöVille Kotimäki

subject

NanostructureMaterials scienceTransistors ElectronicMacromolecular SubstancesSurface PropertiesMolecular ConformationGeneral Physics and AstronomyNanotechnologyCarbon nanotubelaw.inventionComputer Science::Emerging TechnologiesGate oxidelawMaterials TestingElectric ImpedanceNanotechnologyGeneral Materials ScienceParticle SizeTransistorGeneral EngineeringOxidesEquipment DesignCondensed Matter::Mesoscopic Systems and Quantum Hall EffectNanostructuresEquipment Failure AnalysisHysteresisQuantum dotField-effect transistorCrystallizationVoltage

description

We demonstrate controllable and gate-tunable negative differential resistance in carbon nanotube field-effect transistors, at room temperature and at 4.2 K. This is achieved by effectively creating quantum dots along the carbon nanotube channel by patterning the underlying, high-kappa gate oxide. The negative differential resistance feature can be modulated by both the gate and the drain-source voltage, which leads to more than 20% change of the current peak-to-valley ratio. Our approach is fully scalable and opens up a possibility for a new class of nanoscale electronic devices using negative differential resistance in their operation.

10.1021/nn100208vhttps://pubmed.ncbi.nlm.nih.gov/20524681