6533b7d2fe1ef96bd125ec1b
RESEARCH PRODUCT
Structural modifications induced by electron irradiation in SiO2 glass: Local densification measurements
Franco Mario GelardiSimonpietro AgnelloGianpiero Buscarinosubject
Range (particle radiation)Materials scienceAnalytical chemistryNucleationGeneral Physics and AstronomyPower lawElectron and positron radiation effects Glasses Point defects and defect clusterslaw.inventionNuclear magnetic resonancelawElectron beam processingIrradiationElectron paramagnetic resonanceSpectroscopyHyperfine structuredescription
We report a study on the structural modifications induced in amorphous silicon dioxide (a-SiO2) by electron irradiation in the dose range from 1.2?103 to 5?106?kGy. This study has been performed by investigating the properties of the 29Si hyperfine structure of the E '? center by electron paramagnetic resonance (EPR) spectroscopy. Our data suggest that the structural modifications induced by irradiation take place through the nucleation of confined high-defective and densified regions statistically dispersed into the whole volume of the material. In addition, we have estimated that in the high dose limit (D?105?kGy) the degree of densification associated to the local (within the defective regions) polyamorphic transition follows a characteristic power law dependence on the dose given by bD?, where b=(2.0?0.3)?10-3, ?=0.160?0.004 and D is the irradiation dose measured in kGy.
| year | journal | country | edition | language |
|---|---|---|---|---|
| 2009-07-01 |