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RESEARCH PRODUCT
Determination of the Absolute Density of Fe3+ and Ni2+ Ions in Langmuir-Blodgett Films
T. FaldumW. MeiselP. Gütlichsubject
inorganic chemicalsX-rayAnalytical chemistrychemistry.chemical_elementSurfaces and InterfacesGeneral ChemistryThermal treatmentCondensed Matter PhysicsLangmuir–Blodgett filmSurfaces Coatings and FilmsIonchemistry.chemical_compoundNickelchemistryMonolayerMaterials ChemistryHydroxideStearic aciddescription
By means of the Langmuir–Blodgett (LB) technique, mono- and multilayers of Ni2+ and Fe3+ containing fatty acid salts are transferred onto silicon wafers. After thermal treatment, oxidic layers can be produced. The absolute amounts of Fe3+ and Ni2+ ions per monolayer of LB film were measured and calculated by three different methods. In the case of nickel, the amount expected from theory and preparation conditions was obtained experimentally. In contrast, about twice the number of Fe3+ ions as expected is transferred. An explanation can be given by the presence of hydroxide groups bound to iron. The mean film thickness of the oxidic layers after thermal treatment was estimated where the thicknesses were found to be <1nm.
| year | journal | country | edition | language |
|---|---|---|---|---|
| 1996-01-01 | Surface and Interface Analysis |