6533b7d6fe1ef96bd126703c
RESEARCH PRODUCT
Alpha spectrometric characterization of thin $^{233}$U sources for $^{229\text{(m)}}$Th production
Ulrich W. SchererChristoph E. DüllmannC. MokryMichelle HufnagelDominik KruppRaphael HaasJörg RunkeRoman AbrosimovD. Renischsubject
Physics - Instrumentation and Detectorsanimal structuresSiliconScanning electron microscopePhysics::Instrumentation and DetectorsAnalytical chemistrychemistry.chemical_element610FOS: Physical sciences01 natural sciencesIonchemistry.chemical_compoundRecoilNitric acid0103 physical sciencesMonolayerddc:610Physical and Theoretical ChemistryNuclear Experiment (nucl-ex)010306 general physicsNuclear Experiment010308 nuclear & particles physicsAlpha particleInstrumentation and Detectors (physics.ins-det)respiratory systemmusculoskeletal systemrespiratory tract diseaseschemistryTitaniumcirculatory and respiratory physiologydescription
Four different techniques were applied for the production of $^{233}$U alpha recoil ion sources, providing $^{229}$Th ions. They were compared with respect to a minimum energy spread of the $^{229}$Th recoil ions, using the emitted alpha particles as an indicator. The techniques of Molecular Plating, Drop-on-Demand inkjet printing, chelation from dilute nitric acid solution on chemically functionalized silicon surfaces, and self-adsorption on passivated titanium surfaces were used. All fabricated sources were characterized by using alpha spectrometry, radiographic imaging, and scanning electron microscopy. A direct validation for the estimated recoil ion rate was obtained by collecting $^{228}$Th recoil ions from $^{232}$U recoil ion sources prepared by self-adsorption and Molecular Plating. The chelation and the self-adsorption based approaches appear most promising for the preparation of recoil ion sources delivering monochromatic recoil ions.
| year | journal | country | edition | language |
|---|---|---|---|---|
| 2020-04-06 |