6533b7d7fe1ef96bd1269037
RESEARCH PRODUCT
High-Speed Memory from Carbon Nanotube Field-Effect Transistors with High-κ Gate Dielectric
Marcus RinkiöGheorghe Sorin ParaoanuPäivi TörmäAndreas Johanssonsubject
Materials sciencebusiness.industryBand gapMechanical EngineeringTransistorGate dielectricBioengineeringNanotechnologyGeneral ChemistryCondensed Matter Physicslaw.inventionlawGate oxideLogic gateOptoelectronicsFigure of meritGeneral Materials ScienceField-effect transistorbusinessHigh-κ dielectricdescription
We demonstrate 100 ns write/erase speed of single-walled carbon nanotube field-effect transistor (SWCNT-FET) memory elements. With this high operation speed, SWCNT-FET memory elements can compete with state of the art commercial Flash memories in this figure of merit. The endurance of the memory elements is shown to exceed 104 cycles. The SWCNT-FETs have atomic layer deposited hafnium oxide as a gate dielectric, and the devices are passivated by another hafnium oxide layer in order to reduce surface chemistry effects. We discuss a model where the hafnium oxide has defect states situated above, but close in energy to, the band gap of the SWCNT. The fast and efficient charging and discharging of these defects is a likely explanation for the observed operation speed of 100 ns which greatly exceeds the SWCNT-FET memory speeds of 10 ms observed earlier for devices with conventional gate oxides.
| year | journal | country | edition | language |
|---|---|---|---|---|
| 2009-01-16 | Nano Letters |