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RESEARCH PRODUCT
Local structure relaxation in nanocrystalline Ni1−xO thin films
Alexei KuzminR. KalendarevAndris AnspoksA. Kalinkosubject
Materials scienceAbsorption spectroscopyNickel oxideMetals and AlloysAb initioAnalytical chemistrychemistry.chemical_element02 engineering and technologySurfaces and InterfacesSputter deposition021001 nanoscience & nanotechnology01 natural sciencesddc:070Nanocrystalline materialSurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsNickelchemistry0103 physical sciencesMaterials ChemistryThin film010306 general physics0210 nano-technologyAbsorption (electromagnetic radiation)description
Abstract Non-stoichiometric nickel oxide (Ni 1 − x O) thin films were prepared by DC magnetron sputtering technique in mixed Ar/O 2 atmosphere and studied by synchrotron radiation Ni K-edge x-ray absorption spectroscopy, x-ray diffraction and scanning electron microscopy. The use of advanced modelling technique, combining classical molecular dynamics with ab initio multiple-scattering extended x-ray absorption fine structure calculations, allowed us to describe the structure relaxation and dynamics in nanocrystallites and to estimate their size and the concentration of nickel vacancies.
| year | journal | country | edition | language |
|---|---|---|---|---|
| 2014-02-01 | Thin Solid Films |