6533b7ddfe1ef96bd1274003
RESEARCH PRODUCT
Surface investigation of plasma HMDSO membranes post-treated by CF4/Ar plasma
M. KirchnerLouis CotEric FinotVincent RouessacJp GoudonnetRené BerjoanStéphanie RoualdesJean Durandsubject
PECVDAnalytical chemistryGeneral Physics and Astronomychemistry.chemical_elementsurface treatments02 engineering and technologySKIN LAYER01 natural sciencesContact angleX-ray photoelectron spectroscopyPlasma-enhanced chemical vapor deposition0103 physical sciencesXPSmembranecontact angle010302 applied physicsGlow dischargeArgonFORCE MICROSCOPYSurfaces and InterfacesGeneral ChemistryPlasma[CHIM.MATE]Chemical Sciences/Material chemistry021001 nanoscience & nanotechnologyCondensed Matter PhysicsTRANSPORTSurfaces Coatings and FilmsAmorphous solidMembranechemistryGAS[ CHIM.MATE ] Chemical Sciences/Material chemistryAFM0210 nano-technologydescription
Fluorination treatment has been performed on polysiloxane membranes using a plasma glow discharge of a gases mixture CF4 and argon (plasma enhanced chemical vapor deposition). Atomic force microscopy, XPS analyses and contact angle measurements have been undertaken to explain the surface transformation and behavior, which strongly depend on the morphology, the composition and the hydrophilic/hydrophobic character of the plasma-polymerized initial membranes. Main result is that fluorination, which leads to hydrophobic membranes, has a more relevant effect on amorphous silica-like membranes than on polymer-like ones, according to their chemical composition whereas the plasma surface reaction induces a substantial microstructural modification of the polymer-like membrane, i.e. the grains and aggregates size and distribution. (C) 2002 Elsevier Science B.V. All rights reserved.
year | journal | country | edition | language |
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2002-02-01 |