6533b7defe1ef96bd127665a
RESEARCH PRODUCT
Soft X-ray emission spectroscopy used for the characterization of a-C and CNx thin films
Ya.v. ZaulichnyyGerd SchönhenseSergej A. NepijkoKaterina MedjanikS. ChernovMichael KlimenkovO.v. VlasenkoLarysa Valentynivna OdnodvoretsS.s. PetrovskayaAlisa Chernenkayasubject
Materials scienceElectron energy loss spectroscopyMetals and AlloysAnalytical chemistryFilm densitySurfaces and InterfacesSurfaces Coatings and FilmsElectronic Optical and Magnetic Materialschemistry.chemical_compoundchemistryHomogeneity (physics)Materials ChemistryEmission spectrumSoft X-ray emission spectroscopyThin filmCarbon nitridedescription
Abstract We present the results of a soft X-ray emission spectroscopy study of a-C and CNx films on a Si(100) substrate. Also for the characterization of the homogeneity in depth of these films electron energy loss spectroscopy measurements with localization better than 4 nm were carried out. In case of CNx films the highest diamond-like modification occurs in the region close to the Si(100) substrate. The film density decreases with increasing distance from the substrate and becomes almost constant in range of thicknesses more than ~ 2 nm.
| year | journal | country | edition | language |
|---|---|---|---|---|
| 2015-02-01 | Thin Solid Films |