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RESEARCH PRODUCT
Photoinduced direct surface relief formation in amorphous As40S15Se45 films
Mara ReinfeldeJanis Teterissubject
Materials scienceSurface reliefbusiness.industrySubstrate (electronics)Condensed Matter PhysicsLaserElectronic Optical and Magnetic MaterialsAmorphous solidlaw.inventionOpticslawMaterials ChemistryCeramics and CompositesOptoelectronicsbusinessSurface relief gratingHolographic recordingdescription
Abstract The surface relief grating formation in As40S15Se45 films under He–Ne laser wave-length λ = 0.6328 μm light influence was examined. The obtained experimental results showed the strong dependence of photoinduced surface relief depth on illumination dose and film thickness during holographic recording from film side as well as from glass substrate side. The surface relief grating profile over the thickness range 0.13
year | journal | country | edition | language |
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2013-10-01 | Journal of Non-Crystalline Solids |