6533b828fe1ef96bd1287bfc
RESEARCH PRODUCT
Sputtered transparent electrodes for optoelectronic devices
Cesur AltinkayaCesur AltinkayaThomas AllenKassio P. S. ZanoniMonica Morales-masisErkan AydinStefaan De WolfThomas D. AnthopoulosYuliar FirdausYuliar FirdausAbhyuday PaliwalHenk J. BolinkMuhammad A. YaqinYury Smirnovsubject
Materials sciencebusiness.industry22/2 OA procedureSputter depositionBuffer (optical fiber)law.inventionSputteringlawElectrodeOptoelectronicsGeneral Materials ScienceThin filmbusinessLayer (electronics)DiodeLight-emitting diodedescription
Summary Transparent electrodes and metal contacts deposited by magnetron sputtering find applications in numerous state-of-the-art optoelectronic devices, such as solar cells and light-emitting diodes. However, the deposition of such thin films may damage underlying sensitive device layers due to plasma emission and particle impact. Inserting a buffer layer to shield against such damage is a common mitigation approach. We start this review by describing how sputtered transparent top electrodes have become archetypal for a broad range of optoelectronic devices and then discuss the possible detrimental consequences of sputter damage on device performance. Next, we review common buffer-layer materials in view of their processing-property-performance relationship. Finally, we discuss strategies to eliminate the buffer-layer requirement by implementing alternative, soft-landing deposition techniques for top electrodes. Our review highlights the critical issue of sputter damage for optoelectronic devices, formulates mitigation strategies, and provides cross-field learnings that can lead to more efficient and reliable optoelectronic devices aimed for commercialization.
year | journal | country | edition | language |
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2021-11-03 | Matter |