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RESEARCH PRODUCT
Structure and composition of sputter-deposited nickel-tungsten oxide films
Claes-göran GranqvistGunnar A. NiklassonJuris PuransAlexei KuzminSara Greensubject
X-ray photoelectron spectroscopyMaterials scienceOxideAnalytical chemistrychemistry.chemical_element02 engineering and technology010402 general chemistry01 natural sciencesMetalchemistry.chemical_compoundX-ray photoelectron spectroscopySputteringMaterialteknikMaterials ChemistryNickel oxideRutherford backscatteringNickel oxideMetals and AlloysTungsten oxideMaterials EngineeringSurfaces and Interfaces021001 nanoscience & nanotechnologyX-ray diffraction0104 chemical sciencesSurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsNickelchemistryvisual_artRaman spectroscopyX-ray crystallographyCavity magnetronvisual_art.visual_art_medium0210 nano-technologydescription
Films of mixed nickel-tungsten oxide, denoted NixW1-x oxide, were prepared by reactive DC magnetron co-sputtering from metallic targets and were characterized by Rutherford backscattering spectrometry. X-ray photoelectron spectroscopy, X-ray diffractometry and Raman spectroscopy. A consistent picture of the structure and composition emerged, and at x<0.50 the films comprised a mixture of amorphous WO3 and nanosized NiWO4, at x = 0.50 the nanosized NiWO4 phase was dominating, and at x>0.50 the films contained nanosized NiO and NiWO4.
| year | journal | country | edition | language |
|---|---|---|---|---|
| 2011-01-01 | Thin Solid Films |