6533b835fe1ef96bd129f3c2
RESEARCH PRODUCT
Thermal stability under air of tungsten–titanium diffusion barrier layer between silica and platinum
Bruno DomenichiniJ. NazonP. SimonSylvie Bourgeoissubject
Materials scienceDiffusion barrierAnnealing (metallurgy)General Chemical EngineeringMetallurgychemistry.chemical_elementGeneral ChemistryTungstenchemistryChemical engineeringGeneral Materials ScienceSublimation (phase transition)Thermal stabilityThin filmPlatinumTitaniumdescription
Abstract The present work investigated the thermal stability of tungsten–titanium diffusion barrier layers intercalated between SiO 2 substrate and platinum thin film. The resulting structures were annealed under air in the temperature range 400–600 °C for annealing times up to 100 h. Chemical and structural characterizations at different stages of the treatment evidenced several phenomena occurring during annealing under air, especially the complete oxidation of the adhesive layer, the diffusion of tungsten oxide through platinum film at particle boundaries as well as the sublimation process of tungsten oxide. The results of film surface chemistry and microstructure were correlated with diffusion phenomena.
| year | journal | country | edition | language |
|---|---|---|---|---|
| 2014-01-01 | Corrosion Science |