6533b857fe1ef96bd12b4f3d
RESEARCH PRODUCT
Nanofabrication on 2D and 3D Topography via Positive‐Tone Direct‐Write Laser Lithography
Jaakko MastomäkiZhuoran GengSamuli HeiskanenIlari Maasiltasubject
Materials sciencelift‐off nanofabricationbusiness.industrynanotekniikka02 engineering and technologytwo‐photon absorption010402 general chemistry021001 nanoscience & nanotechnologyCondensed Matter Physicslasertekniikka01 natural sciencesTwo-photon absorption3d topographydirect laser writing0104 chemical sciencesTone (musical instrument)NanolithographynanorakenteetOptoelectronicsGeneral Materials Science0210 nano-technologybusinessMaskless lithographypositive‐tone resistdescription
Direct laser writing (DLW) lithography using two‐photon absorption is a powerful technique mostly used for fabrication of complex structures in micro‐ and nanoscale, by photopolymerizing a negative‐tone resist. In contrast, in this study it is demonstrated that DLW is also well suited for fabricating nano‐ to microscale metallic structures using lift‐off and a positive‐tone photoresist. It is shown first that versatile, fast and large area fabrication is possible on flat two‐dimensional insulating substrates, and an expression for how the line width varies with the scanning speed is derived, with excellent agreement with the experiments. Even more interestingly, a unique application for the DLW lift‐off process is demonstrated, by fabricating sub‐micron scale metallic wiring on uneven substrates with sloping elevation changes as high as 20 µm. Such fabrication is practically impossible with more standard lithographic techniques. peerReviewed
| year | journal | country | edition | language |
|---|---|---|---|---|
| 2019-11-28 | Advanced Engineering Materials |