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RESEARCH PRODUCT
Structural and electrical properties in tungsten/tungsten oxide multilayers
Arnaud CacucciNicolas MartinLuc ImhoffValérie Potinsubject
Materials scienceInorganic chemistrychemistry.chemical_element02 engineering and technologyTungsten01 natural sciencesCrystallinityVan der Pauw methodElectrical resistivity and conductivitySputtering0103 physical sciencesMaterials ChemistryThin film[SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics010302 applied physicsTungsten CompoundsMetals and AlloysSurfaces and Interfaces021001 nanoscience & nanotechnologySurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsAmorphous solidchemistryChemical engineering[ SPI.NANO ] Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics0210 nano-technologydescription
International audience; Tungsten and tungsten oxide periodic nanometric multilayers have been deposited by DC reactive sputtering using the reactive gas pulsing process. Different pulsing periods have been used for each deposition to produce metal-oxide periodic alternations ranging from 3.3 to 71.5 nm. The morphology, crystallinity and chemical composition of these films have been investigated by transmission electron microscopy and energy-dispersive X-ray spectroscopy techniques. The produced multilayers exhibited an amorphous structure and the composition stability of WO3 sub-layers has been pointed out. Moreover, electrical properties have also been studied by the van der Pauw technique. It revealed a clear stability of resistivity versus temperature for almost all samples and an influence of the multilayered structure on the resistivity behavior
| year | journal | country | edition | language |
|---|---|---|---|---|
| 2014-02-01 |