6533b85ffe1ef96bd12c0fcd
RESEARCH PRODUCT
Deposition of Pt and Sn doped CeOx layers on silicon substrate
Stéphanie BruyèreIva MatolínováValérie PotinVladimír MatolínMykhailo VorokhtaArnaud Cacuccisubject
Materials scienceSiliconInorganic chemistryDopingchemistry.chemical_elementSurfaces and InterfacesGeneral ChemistrySubstrate (electronics)Sputter depositionCondensed Matter PhysicsSurfaces Coatings and FilmschemistryChemical engineeringTransmission electron microscopyMaterials ChemistryThin filmTinPlatinumdescription
Abstract Radio Frequency Magnetron Sputtering is used to elaborate CeO x layers doped with platinum and/or tin on a SiO 2 /Si substrate. Morphology, chemical composition and crystallographic structures were investigated by Transmission Electron Microscopy. The presence of nanoparticles of mainly ceria and metallic platinum is exhibited.
year | journal | country | edition | language |
---|---|---|---|---|
2013-07-01 | Surface and Coatings Technology |