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RESEARCH PRODUCT

Deposition of Pt and Sn doped CeOx layers on silicon substrate

Stéphanie BruyèreIva MatolínováValérie PotinVladimír MatolínMykhailo VorokhtaArnaud Cacucci

subject

Materials scienceSiliconInorganic chemistryDopingchemistry.chemical_elementSurfaces and InterfacesGeneral ChemistrySubstrate (electronics)Sputter depositionCondensed Matter PhysicsSurfaces Coatings and FilmschemistryChemical engineeringTransmission electron microscopyMaterials ChemistryThin filmTinPlatinum

description

Abstract Radio Frequency Magnetron Sputtering is used to elaborate CeO x layers doped with platinum and/or tin on a SiO 2 /Si substrate. Morphology, chemical composition and crystallographic structures were investigated by Transmission Electron Microscopy. The presence of nanoparticles of mainly ceria and metallic platinum is exhibited.

https://doi.org/10.1016/j.surfcoat.2012.08.036