6533b86efe1ef96bd12cc7b1
RESEARCH PRODUCT
XAS, XRD, AFM and Raman studies of nickel tungstate electrochromic thin films
J. PuransD. PailhareyAlexei KuzminYves MatheyR. Kalendarevsubject
X-ray absorption spectroscopyMaterials scienceGeneral Chemical EngineeringAnalytical chemistryTungsten trioxideNanocrystalline materialAmorphous solidchemistry.chemical_compoundsymbols.namesakeTungstatechemistryElectrochromismElectrochemistrysymbolsThin filmRaman spectroscopydescription
Abstract Systematic studies of nanocrystalline nickel tungstate, NiWO 4 , thin films were performed by several experimental techniques such as Ni K- and W L 1,3 -edges X-ray absorption spectroscopy, X-ray diffraction, Raman spectroscopy, atomic force microscopy and cyclic voltammetry measurements. We found that the NiWO 4 thin films exhibit electrochromic properties similar to that of amorphous tungsten trioxide films, but show better structural stability upon multiple colouring/bleaching cycling. It was observed that a nanocrystallinity of the thin films results in strong modifications of the NiO and WO interactions, which affect both local atomic and vibrational structures.
| year | journal | country | edition | language |
|---|---|---|---|---|
| 2001-04-01 | Electrochimica Acta |