6533b870fe1ef96bd12d06c8
RESEARCH PRODUCT
Photoelectron emission experiments with ECR-driven multi-dipolar negative ion plasma source
Taneli KalvasJanne LaulainenOlli TarvainenS. AleiferisPanagiotis SvarnasRisto KronholmHannu Koivistosubject
plasma sourcesta114HydrogenWavelength rangeChemistryPhysics::Instrumentation and DetectorssyklotronitMicrowave powerAnalytical chemistrychemistry.chemical_elementPlasmaplasmatekniikkaelektronitIonElectric arcECR ion sourcesDipolePhysics::Plasma PhysicsPhysics::Atomic and Molecular ClustersphotoelectronsCurrent (fluid)Atomic physicsemissio (fysiikka)description
Photoelectron emission measurements have been performed using a 2.45 GHz ECR-driven multi-dipolar plasma source in a low pressure hydrogen discharge. Photoelectron currents induced by light emitted from ECR zone and H− production region are measured from Al, Cu, Mo, Ta, and stainless steel (SAE 304) surfaces as a function of microwave power and neutral hydrogen pressure. The total photoelectron current from the plasma chamber wall is estimated to reach values up to 1 A for 900 W of injected microwave power. It is concluded that the volumetric photon emission rate in wavelength range relevant for photoelectron emission is a few times higher in arc discharge. peerReviewed
| year | journal | country | edition | language |
|---|---|---|---|---|
| 2017-01-01 |