6533b871fe1ef96bd12d17c0

RESEARCH PRODUCT

Resist-based silver nanocomposites synthesized by lithographic methods

Rafael AbarguesJuan P. Martínez-pastorJosep Canet-ferrerJose Marques-huesoJ. L. Valdes

subject

Vinyl alcoholMaterials sciencetechnology industry and agricultureNanoparticleNanotechnologyPhotoresistCondensed Matter PhysicsAtomic and Molecular Physics and OpticsSilver nanoparticleSurfaces Coatings and FilmsElectronic Optical and Magnetic Materialslaw.inventionchemistry.chemical_compoundchemistryResistlawElectrical and Electronic EngineeringPhotolithographyLithographyElectron-beam lithography

description

In this work, the formation of silver metal nanoparticles inside a negative-tone resist based on poly(vinyl alcohol) is achieved by electron beam lithography. The chemistry of this sensitive resist allows the production of nanoparticles as well as the polymer crosslinking by the electron radiation. Due to the presence of the silver nanoparticles, the final composite exhibits a plasmonic behavior, which was characterized by measuring the absorbance. The lithographic properties of the resist have been characterized. The technique has also been exported to UV lithography, where silver nanoparticles are obtained inside the polymeric patterns after optical lithography.

yearjournalcountryeditionlanguage
2010-05-01Microelectronic Engineering
https://doi.org/10.1016/j.mee.2009.10.043