Search results for "Composite"

showing 10 items of 4584 documents

Novel silicon microparticles to improve sunlight stability of raw polypropylene

2015

Oxidation of polyolefins by ultraviolet/visible irradiation is a significant limitation for their use in several technological applications. The use of high-tech additives such as silicon microparticles becomes a compositing strategy that can improve the performance of these materials at long-term service conditions. Silicon particles were added to non-additivated raw polypropylene (PP) prepared by hot melt extrusion and subjected to accelerated sunlight irradiation tests. The stability of thermal properties, mechanical performance and thermal decomposition behaviour of composites was evaluated by differential scanning calorimetry, dynamic mechanical thermal analysis and thermogravimetry. T…

Silicon microparticlesSunlight irradiationNear-IR reflective pigmentSolucions polimèriquesMaterials sciencePolymers and PlasticsSiliconGeneral Physics and Astronomychemistry.chemical_elementCompositechemistry.chemical_compoundCIENCIA DE LOS MATERIALES E INGENIERIA METALURGICAMaterials ChemistryThermal stabilityThermal analysisComposite materialPhotodegradationThermal analysisPhoto-degradationPlastic additivesPolypropyleneTermoplàsticsOrganic ChemistryThermal decompositionPolyolefinPolyolefinThermogravimetrychemistryMAQUINAS Y MOTORES TERMICOSPolypropyleneEuropean Polymer Journal
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Advanced fragmentation stage of oxide coating on polymer substrate under biaxial tension

2005

Crack patterns of 100-nm-thick silicon oxide coating on polypropylene film subjected to equibiaxial stress loading are studied experimentally. The loading is achieved by means of a bulging cell mounted under an optical microscope with stepwise pressurization of film specimens. The evolution of the coating fragment area distribution at relatively high strains is modeled using Weibull statistics to describe the coating strength. The fragment area distribution at an advanced fragmentation stage is shown to scale with the average fragment area, the latter being a power function of the applied biaxial strain.

Silicon oxidePolypropyleneMaterials sciencePolymersMetals and AlloysBiaxial tensile testSurfaces and Interfacesengineering.materialSurfaces Coatings and FilmsElectronic Optical and Magnetic Materialslaw.inventionchemistry.chemical_compoundchemistryOptical microscopeCoatingFragmentationCoatingslawMaterials ChemistryengineeringPolymer substrateThin filmComposite materialSilicon oxideWeibull distributionThin Solid Films
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Luminescence of ODC(II) in quartz and cristobalite glasses

2022

Abstract The results of the optical spectroscopy of twofold coordinated silicon centers – ODC(II) in quartz and cristobalite glasses are presented. The luminescence and excitation spectra attributed to different local symmetry of ODC(II) were investigated under synchrotron excitation in the VUV region. The observed differences in the luminescence and excitation spectra of ODC(II) are caused by the environment and, therefore, short-range order in the samples.

SiliconAnalytical chemistrychemistry.chemical_elementCondensed Matter PhysicsCristobaliteSynchrotronElectronic Optical and Magnetic Materialslaw.inventionchemistrylawLocal symmetryMaterials ChemistryCeramics and CompositesLuminescenceSpectroscopyQuartzExcitationJournal of Non-Crystalline Solids
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Thermostimulated luminescence and electron spin resonance in X-ray- and photon-irradiated oxygen-deficient silica

2007

Abstract Influences of oxygen-deficiency on radiation properties of high-purity, low-OH fused silica were studied. It is found that thermostimulated luminescence (TSL) peaks are different for photo (7.7 eV) and X-ray excitation at 77 K. X-ray excitation produces TSL peaks at 125 and 170 K corresponding to the anneal temperatures of two types of self-trapped holes centers STH2 and STH1, respectively, detected by electron spin resonance (ESR). Oxygen-deficiency apparently increases the number of electron traps, stabilizing a larger number of STHs in the continuous defect-free silica network than is observed in similarly X-irradiated stoichiometric silica glasses. Photoexcitation of oxygen-def…

SiliconChemistryAnalytical chemistrychemistry.chemical_elementElectronCondensed Matter PhysicsThermoluminescenceElectronic Optical and Magnetic Materialslaw.inventionPhotoexcitationParamagnetismlawMaterials ChemistryCeramics and CompositesIrradiationLuminescenceElectron paramagnetic resonanceJournal of Non-Crystalline Solids
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Investigation of optical and radiation properties of oxygen deficient silica glasses

1999

The deficiency of oxygen in pure silica manifests an absorption band at 5 eV as well as an absorption band of higher intensity at 7.6 eV. The band at 5 eV is associated with lone twofold-coordinated silicon centers. The nature of the main band at 7.6 eV has been studied using silica samples with different levels of oxygen deficiency. The excitation via the 7.6 eV band produces a photoelectric response as well as inner center and recombination type luminescence. Two main luminescence bands of the twofold-coordinated silicon center appear: a blue band (2.7 eV) and a UV band (4.4 eV). Induced absorption with several bands as well as thermally stimulated luminescence with complex peak structure…

SiliconChemistryAnalytical chemistrychemistry.chemical_elementPhotoelectric effectCondensed Matter PhysicsOxygenElectronic Optical and Magnetic MaterialsAbsorption bandMaterials ChemistryCeramics and CompositesAtomic physicsAbsorption (electromagnetic radiation)LuminescenceExcitationRecombinationJournal of Non-Crystalline Solids
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Changes in surface stress, morphology and chemical composition of silica and silicon nitride surfaces during the etching by gaseous HF acid

2007

Abstract HF acid attack of SiO2 and Si3N4 substrates is analyzed to improve the sensitivity of a sensor based on microcantilever. Ex situ analysis of the etching using XPS, SIMS and AFM show significant changes in the anisotropy and the rate of the etching of the oxides on SiO2 and Si3N4 surface. Those differences influence the kinetic evolution of the plastic bending deflection of the cantilever coated with SiO2 and Si3N4 layer, respectively. The linear dependence between the HF concentration and the Si3N4 cantilever bending corresponds to a deep attack of the layer whereas the non-linear behavior observed for SiO2 layer can be explained by a combination of deep and lateral etching. The ca…

SiliconChemistrySurface stressAnalytical chemistryGeneral Physics and Astronomychemistry.chemical_elementSurfaces and InterfacesGeneral ChemistryCondensed Matter PhysicsSurfaces Coatings and Filmschemistry.chemical_compoundSilicon nitrideX-ray photoelectron spectroscopyEtching (microfabrication)Plastic bendingReactive-ion etchingComposite materialLayer (electronics)Applied Surface Science
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Interconversion between non-bridging oxygen hole center and peroxy radical in F2-laser-irradiated SiO2 glass

2004

Formation processes of the peroxy radical (POR) were examined in high-purity SiO 2 glass exposed to F 2 -laser light which creates mobile atomic oxygen (O 0 ) by photolyzing the interstitial oxygen molecules (O 2 ). It was proved that under these conditions POR is formed by a reaction of the non-bridging oxygen hole center (NBOHC, an oxygen dangling bond) with O 0 , not by a reaction between the E' center (a silicon dangling bond) and O 2 . Subsequent exposure to KrF laser light photolyzes POR and recoveres NBOHC by dissociating the O-O bond in POR. These findings corroborate the important role of O° in defect processes in SiO 2 glass.

SiliconDangling bondchemistry.chemical_elementCondensed Matter PhysicsLaserPhotochemistryOxygenElectronic Optical and Magnetic Materialslaw.inventionBridging oxygenchemistrylawMaterials ChemistryCeramics and CompositesAtomic oxygenMoleculeIrradiationJournal of Non-Crystalline Solids
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Interaction of Gold with Co-Condensed and Grafted HMS-SH Silica: A 29Si {1H} CP-MAS NMR Spectroscopy, XRD, XPS and Au LIII EXAFS Study

2010

Hexagonal mesoporous silica (HMS) is functionalised with mercaptopropyl groups by adopting two different procedures ; co-condensation and grafting. In both cases tetraethylorthosilicate (TEOS) and 3-mercaptopropyltriethoxysilane (3-MPTES) are used as the silicon and sulfur precursors, respectively. The obtained materials are analysed by several techniques such as N 2 sorption, TG-DTA, XRD, SAXS and-solid state 29 Si { 1 H} CP-MAS NMR spectroscopy. By taking advantage of the chemical interaction between gold and the -SH groups, the effect of the thiol addition procedure on the supporting capability of the functionalised silica is evaluated by depositing gold through the incipient wet impregn…

SiliconExtended X-ray absorption fine structureAbsorption spectroscopySmall-angle X-ray scatteringInorganic chemistrychemistry.chemical_elementSorptionNuclear magnetic resonance spectroscopyMesoporous silica* Inorganic-organic hybrid compositeInorganic ChemistrychemistryX-ray photoelectron spectroscopy* Silica* Sulfur* Gold* Mesoporous materialNuclear chemistrySettore CHIM/02 - Chimica Fisica
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Fluorine laser-induced silicon hydride SiH groups in silica

2007

Abstract Formation and destruction of silicon hydride (Si–H) groups in silica by F 2 laser irradiation and their vacuum ultraviolet (VUV) optical absorption was examined by infrared (IR) and VUV spectroscopy. Photoinduced creation of Si–H groups in H 2 -impregnated oxygen deficient silica is accompanied by a growth of infrared absorption band at 2250 cm −1 and by a strong increase of VUV transmission at 7.9 eV. Photolysis of Si–H groups by 7.9 eV photons in this glass was not detected when the irradiation was performed at temperature 80 K. However, a slight destruction of Si–H groups under 7.9 eV irradiation was observed at the room temperature. This finding gives a tentative estimate of VU…

SiliconHydrideInfraredAbsorption cross sectionAnalytical chemistrychemistry.chemical_elementInfrared spectroscopyCondensed Matter PhysicsPhotochemistryElectronic Optical and Magnetic MaterialschemistryAbsorption edgeMaterials ChemistryCeramics and CompositesIrradiationAbsorption (electromagnetic radiation)J. Non-Cryst. Solids
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Proton conducting composite electrolytes based on antimonic acid

1997

Abstract This report concerns a composite proton electrolyte suitable for use in electrochromic devices. The electrolyte consists of nanosize pyrochlore antimonic acid particles suspended in a poly(vinyl acetate) matrix by a gel route. It was found possible to substitute the antimonic acid by inert oxides of aluminum and silicon, thus making the electrolyte less harmful to the oxide electrodes of the electrochromic devices without considerably decreasing the conductivity. The proton conductivity of the antimonic acid electrolyte was ∼10 −4 S/cm at room temperature, practically independent of its amount of absorbed water.

SiliconInorganic chemistryComposite numberOxidechemistry.chemical_elementGeneral ChemistryElectrolyteConductivityCondensed Matter PhysicsElectrochromic deviceschemistry.chemical_compoundchemistryElectrochromismVinyl acetateGeneral Materials Science
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