Search results for "Den kondenserade materiens fysik"
showing 3 items of 13 documents
Seed‐Layer‐Free Atomic Layer Deposition of Highly Uniform Al 2 O 3 Thin Films onto Monolayer Epitaxial Graphene on Silicon Carbide
2019
Atomic layer deposition (ALD) is the method of choice to obtain uniform insulating films on graphene for device applications. Owing to the lack of out-of-plane bonds in the sp(2) lattice of graphene, nucleation of ALD layers is typically promoted by functionalization treatments or predeposition of a seed layer, which, in turn, can adversely affect graphene electrical properties. Hence, ALD of dielectrics on graphene without prefunctionalization and seed layers would be highly desirable. In this work, uniform Al2O3 films are obtained by seed-layer-free thermal ALD at 250 degrees C on highly homogeneous monolayer (1L) epitaxial graphene (EG) (amp;gt;98% 1L coverage) grown on on-axis 4H-SiC(00…
New Quadratic Self-Assembly of Double-Decker Phthalocyanine on Gold(111) Surface : From Macroscopic to Microscopic Scale
2018
Unveiling the self-organization mechanism of semiconducting organic molecules onto metallic surfaces is the first step to design hybrid devices in which the self-assembling is exploited to tailor magnetic properties. In this study, double-decker rare-earth phthalocyanines, namely, lutetium phthalocyanine (LuPc2), are deposited on Au(111) gold surface forming large-scale self-assemblies. Global and local experimental techniques, namely, grazing incidence X-ray diffraction and scanning tunneling microscopy, supplemented by density functional theory calculations with van der Waals corrections, give insight into the molecular structural arrangement of the thin film and the self organization at …
Hard x-ray photoelectron spectroscopy: a snapshot of the state-of-the-art in 2020
2021
Journal of physics / Condensed matter 33(23), 233001 (1-44) (2021). doi:10.1088/1361-648X/abeacd