Search results for "Photoresist"
showing 5 items of 25 documents
UV-patternable nanocomposite containing CdSe and PbS quantum dots as miniaturized luminescent chemo-sensors
2015
In this study, a novel multifunctional hybrid polymer-based luminescent material, particularly formulated for photolithography, was developed, fabricated and tested as a miniaturized chemosensor. This nanocomposites were formulated with either luminescent CdSe (for the visible) or PbS (for the near-IR) colloidal QDs embedded in a polyisoprene-based photoresist (PIP). We checked the sensing capability of the nanocomposite by exposing 1 cm2 CdSe nanocomposite patterns to vapours of some analyte solutions such as 2-mercaptoethanol (MET) and ethylenediamine (EDA). The transduction mechanism of the sensor is based on changes of the QD photoluminescence (PL) when molecules are adsorbed on the QD …
Patterning of Conducting Polymers Using UV Lithography: The in-Situ Polymerization Approach
2012
We report on the in-situ polymerization of 3T with Cu(ClO4)2 inside several host polymers such as Novolak-based negative-tone photoresist, polystyrene (PS), poly(4-vinylphenol) (P4VP), poly(methyl methacrylate) (PMMA), and poly(4-vinylphenol)-co-(methyl methacrylate) (P4VP-co-MMA) to form an interpenetrating polymer network (IPN). Conducting IPN films in the order of 10–4–150 S/cm are obtained depending on the specific IPN composition. Moreover, the convenience of this synthetic approach has been demonstrated using a commercially available negative-tone photoresist based on Novolak as a host polymer. Novolak photoresist was properly formulated with 3T and Cu(ClO4)2 to preserve as far as pos…
In-situ synthesis of thiophene-based multifunctional polymeric networks with tunable conductivity and high photolithographic performance
2017
Abstract Design of novel multifunctional polymeric materials combining electrically conducting properties with patterning capability is a significant challenge in materials science. Herein, we report on the synthesis of multifunctional interpenetrating polymer networks (IPN) by the in-situ oxidative polymerization of thiophene-based monomers with Cu(ClO 4 ) 2 inside a novolac-based photoresist. The resulting IPNs show conductivities up to 20 S/cm depending on the monomer properties. Among them, 3,3‴-Dihexyl-2,2’:5′,2’’:5″,2‴-quaterthiophene (DH4T) is chosen because it has the largest conjugation length and excellent solubility in organic solvents. Moreover, it renders a low percolation thre…
3D defect engineering in polymer opals
2006
The possibility to create defined structures inside a synthetic opal is a key step towards applications in optics, where control of the propagation of light inside a photonic crystal is necessary. Here we report different methods for realizing defined embedded defects in opaline structures. Monodisperse colloids are synthesized by surfactant free emulsion polymerization of the acid labile monomer t-butyl-methacrylate (tBMA). The PtBMA colloids can be filled with sensitizer and photo acid generator and it is possible to crystallize them into photosensitive polymer opals. One method for the introduction of defects is a multilayer build-up of photo-labile (filled with photo acid generator) and…
Photobleaching and Recovery Kinetics of a Palette of Carbon Nanodots Probed by In Situ Optical Spectroscopy
2022
Carbon dots (CDs) are a family of fluorescent nanoparticles displaying a wide range of interesting properties, which make them attractive for potential applications in different fields like bioimaging, photocatalysis, and many others. However, despite many years of dedicated studies, wide variations exist in the literature concerning the reported photostability of CDs, and even the photoluminescence mechanism is still unclear. Furthermore, an increasing number of recent studies have highlighted the photobleaching (PB) of CDs under intense UV or visible light beams. PB phenomena need to be fully addressed to optimize practical uses of CDs and can also provide information on the fundamental m…