Search results for "WAVELENGTH"

showing 10 items of 741 documents

Light-induced ionic processes in optical oxide glasses

1991

Abstract The density of optical glasses is changed by the influence of light capable of generating color centers in these materials. Such defect generation is not only an electronic process, but an atomic displacement is also necessary. The strong localization of electronic and vibrational excitations in the glass network leads to the high efficiency of sub-threshold defect generation. Secondary ionic processes lead to the changes of basic glass properties (light refractive index, density, mechanical strength, etc.); thus, it is possible to use optical glasses as light detectors for appropriate wavelengths.

Materials sciencebusiness.industryDetectorOxideIonic bondingCondensed Matter PhysicsCondensed Matter::Disordered Systems and Neural NetworksElectronic Optical and Magnetic Materialschemistry.chemical_compoundWavelengthchemistryMechanical strengthMaterials ChemistryCeramics and CompositesLight inducedOptoelectronicsbusinessAtomic displacementRefractive indexJournal of Non-Crystalline Solids
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Responsivity measurements of 4H-SiC Schottky photodiodes for UV light monitoring

2014

We report on the design and the electro-optical characterization of a novel class of 4H-SiC vertical Schottky UV detectors, based on the pinch-off surface effect and obtained employing Ni2Si interdigitated strips. We have measured, in dark conditions, the forward and reverse I–V characteristics as a function of the temperature and the C–V characteristics. Responsivity measurements of the devices, as a function of the wavelength (in the 200 – 400 nm range), of the package temperature and of the applied reverse bias are reported. We compared devices featured by different strip pitch size, and found that the 10 μm device pitch exhibits the best results, being the best compromise in terms of fu…

Materials sciencebusiness.industryDetectorSchottky diodeSTRIPSmedicine.disease_causeSettore ING-INF/01 - ElettronicaPhotodiodelaw.inventionResponsivityWavelengthchemistry.chemical_compoundOpticschemistrylawmedicineSilicon carbideOptoelectronicssic 4h-sic uv photodiodes schottky detectorsbusinessUltravioletSilicon Photonics IX
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Abrupt-tapered fiber filter arrangement for a switchable multi-wavelength and tunable Tm-doped fiber laser.

2018

A switchable and tunable multi-wavelength Tm-doped fiber laser is successfully demonstrated using a filter constructed with two tapered fiber elements in the cavity. The proposed system design uses a low-cost simple filter that allows stable dual, triple, quadruple, and quintuple-wavelength emission operation in the region around 1.9 μm. In the dual wavelength regime, the laser is capable of independently tuning each wavelength. For switching and tuning, a curvature is applied to the tapered fibers.

Materials sciencebusiness.industryDopingPhysics::Optics02 engineering and technologyLaserCurvatureAtomic and Molecular Physics and Opticslaw.inventionWavelength020210 optoelectronics & photonicsOpticsFiber Bragg gratingFilter (video)lawFiber laser0202 electrical engineering electronic engineering information engineeringFiberbusinessOptics express
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Signal Amplification in CsPbBr3 Nanoparticle-Doped Photonic Crystal Fibers

2019

Nanoparticles (NPs) have been proved for various photonic and optoelectronic applications with superior performance. Doping holey-fibers with colloidal NPs is an idea with precedents in the optical literature. For example, CdZnS/ZnS core-shell quantum dots (QDs) based lasers at visible wavelengths [1, 2]; and PbS QDs doped fiber amplifiers operating at telecommunication wavelengths [3]. In this paper we harness the potential of photonic crystal fibers (PCFs) doped with chemically synthesized CsPbBr 3 Colloidal-NPs [4] to demonstrate gain functionalities in all-fiber optical microdevices.

Materials sciencebusiness.industryDopingPhysics::OpticsNanoparticle02 engineering and technology010402 general chemistry021001 nanoscience & nanotechnologyLaser01 natural sciences0104 chemical scienceslaw.inventionCondensed Matter::Materials ScienceWavelengthlawQuantum dotOptoelectronicsPhotonics0210 nano-technologybusinessVisible spectrumPhotonic-crystal fiber2019 Conference on Lasers and Electro-Optics Europe & European Quantum Electronics Conference (CLEO/Europe-EQEC)
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Thermal expansion, normalized thermo-optic coefficients, and condition for second harmonic generation of a Nd:YAG laser with wide temperature bandwid…

2011

Interferometric determination of thermal expansion and of normalized thermo-optic coefficients of RbTiOPO4 at four laser wavelengths are performed as a function of temperature. A suitable vectorial formalism applied to obtained data allows the establishment of the temperature dependence of refractive indices, and subsequent theoretical analysis enables one to predict that an extremum in the evolution of the phase-matching direction in the (X,Y) plane should occur near 100 °C for type II second harmonic generation of Nd:YAG lasers, with a temperature bandwidth that can be as large as 117 °C for a crystal of 10 mm in length. Such unusual behavior is observed experimentally by recording the co…

Materials sciencebusiness.industryEnergy conversion efficiencyPhysics::OpticsNonlinear opticsSecond-harmonic generationStatistical and Nonlinear PhysicsLaserAtomic and Molecular Physics and OpticsThermal expansionlaw.inventionWavelengthOpticslawNd:YAG laserbusinessRefractive indexJournal of the Optical Society of America B
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At-wavelength inspection of sub-40 nm defects in extreme ultraviolet lithography mask blank by photoemission electron microscopy.

2007

A new at-wavelength inspection technology to probe nanoscale defects buried underneath Mo/Si multilayers on an extreme ultraviolet (EUV) lithography mask blank has been implemented using EUV photoemission electron microscopy (EUV-PEEM). EUV-PEEM images of programmed defect structures of various lateral and vertical sizes recorded at an ~13.5 nm wavelength show that 35 nm wide and 4 nm high buried line defects are clearly detectable. The imaging technique proves to be sensitive to small phase jumps, enhancing the edge visibility of the phase defects, which is explained in terms of a standing wave enhanced image contrast at resonant EUV illumination.

Materials sciencebusiness.industryExtreme ultraviolet lithographyAtomic and Molecular Physics and Opticslaw.inventionPhotoemission electron microscopyWavelengthOpticslawExtreme ultravioletMicroscopyOptoelectronicsPhotolithographybusinessLithographyElectron-beam lithographyOptics letters
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Actinic EUVL mask blank defect inspection by EUV photoelectron microscopy

2006

A new method for the actinic at-wavelength inspection of defects inside and ontop of Extreme Ultraviolet Lithography (EUVL) multilayer-coated mask blanks is presented. The experimental technique is based on PhotoElectron Emission Microscopy (PEEM) supported by the generation of a standing wave field inside and above the multilayer mask blank when illuminated near the resonance Bragg wavelength at around 13.5 nm wavelength. Experimental results on programmed defect samples based on e-beam lithographic structures or PSL equivalent silica balls overcoated with an EUV multilayer show that buried defects scaling down to 50 nm in lateral size are detectable with further scalability down to 30 nm …

Materials sciencebusiness.industryExtreme ultraviolet lithographyBlanklaw.inventionStanding waveWavelengthOpticslawExtreme ultravioletMicroscopyOptoelectronicsPhotolithographybusinessLithographySPIE Proceedings
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Actinic inspection of sub-50 nm EUV mask blank defects

2007

A new actinic mask inspection technology to probe nano-scaled defects buried underneath a Mo/Si multilayer reflection coating of an Extreme Ultraviolet Lithography mask blank has been implemented using EUV Photoemission Electron Microscopy (EUV-PEEM). EUV PEEM images of programmed defect structures of various lateral and vertical sizes recorded at around 13 nm wavelength show that 35 nm wide and 4 nm high buried line defects are clearly detectable. The imaging technique proves to be sensitive to small phase jumps enhancing the visibility of the edges of the phase defects which is explained in terms of a standing wave enhanced image contrast at resonant EUV illumination.

Materials sciencebusiness.industryExtreme ultraviolet lithographyMask inspectionlaw.inventionStanding wavePhotoemission electron microscopyWavelengthOpticslawExtreme ultravioletOptoelectronicsPhotolithographyPhotomaskbusiness23rd European Mask and Lithography Conference
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Highly Sensitive plasmonic silver nanorods

2011

We compare the single-particle plasmonic sensitivity of silver and gold nanorods with similar resonance wavelengths by monitoring the plasmon resonance shift upon changing the environment from water to 12.5% sucrose solution. We find that silver nanoparticles have 1.2 to 2 times higher sensitivity than gold, in good agreement with simulations based on the boundary-elements-method (BEM). To exclude the effect of particle volume on sensitivity, we test gold rods with increasing particle width at a given resonance wavelength. Using the Drude-model of optical properties of metals together with the quasi-static approximation (QSA) for localized surface plasmons, we show that the dominant contrib…

Materials sciencebusiness.industryGeneral EngineeringAnalytical chemistryPhysics::OpticsGeneral Physics and AstronomyResonance02 engineering and technology010402 general chemistry021001 nanoscience & nanotechnology01 natural sciencesSilver nanoparticle0104 chemical sciencesWavelengthPhysics::Atomic and Molecular ClustersOptoelectronicsParticleGeneral Materials ScienceNanorodsense organsSurface plasmon resonance0210 nano-technologybusinessPlasmonLocalized surface plasmonACS Nano
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Silicon germanium platform enabling mid-infrared to near-infrared conversion for telecom and sensing applications

2014

This paper presents the potential of silicon germanium waveguides in the nonlinear conversion of light from mid-infrared wavelengths to the telecom band utilizing four-wave mixing. Design aspects and first characterization results of fabricated devices are presented.

Materials sciencebusiness.industryHybrid silicon laserSensing applicationsNear-infrared spectroscopyMid infraredPhysics::OpticsCharacterization (materials science)Silicon-germaniumWavelengthchemistry.chemical_compoundchemistryOptoelectronicsbusinessTelecommunicationsMixing (physics)2014 The European Conference on Optical Communication (ECOC)
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