Search results for "lämpökäsittely"

showing 3 items of 3 documents

To incinerate or not? - Effects of incineration on the concentrations of heavy metals and leaching efficiency of post-precipitated sewage sludge (RAV…

2020

The major element and heavy metal concentrations of post-precipitated sewage sludge (PPS) and its ash residue (PPA) were determined using microwave digestion followed by inductively coupled plasma optical emission spectrometry (ICP-OES) and mass spectrometry (ICP-MS). To the best of our knowledge, this has not been previously done. In both PPS and PPA the heavy metal concentrations were clearly below the average concentrations than those encountered in sewage sludge in Europe. The leaching efficiency of the metal (Al/ Fe) used as a precipitation agent from post-precipitated sludge and its ash residue with phosphoric acid was also investigated with previously optimized leaching conditions. T…

020209 energyphosphorus recovery02 engineering and technologyIncineration010501 environmental sciencesMass spectrometry01 natural sciencesjätevesilieteraskasmetallitMetalchemistry.chemical_compoundMetals Heavysewage sludge ash0202 electrical engineering electronic engineering information engineeringcharacterizationMicrowave digestionfosforiWaste Management and DisposalPhosphoric acid0105 earth and related environmental scienceslämpökäsittelySewageChemistryPhosphorusIncinerationEuropetalteenottovisual_artEnvironmental chemistryliuotusvisual_art.visual_art_mediumLeaching (metallurgy)Inductively coupled plasmathermal treatmentSludgeWaste management (New York, N.Y.)
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Fabrication, Electrical Characterization and 1/f Noise Study of Submicron-sized Superconducting Tunnel Junctions

2016

kylmäfysiikkalämpökäsittelynoiseJosephson junctionsnegative absolute resistancesuprajohtavuus1/f noisemangaanisähkönjohtavuussuprajohteettunnel junctionssuperconductorniobium-based superconducting devicesnanorakenteetcryogenicslow temperature physicsnanofabricationannealingNIS/SIS tunnelingalumiinikohinaniobiumsupercurrent
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Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition

2022

Funding Information: This work was carried out within the MECHALD project funded by Business Finland and is linked to the Finnish Centers of Excellence in Atomic Layer Deposition (Ref. No. 251220) and Nuclear and Accelerator Based Physics (Ref Nos. 213503 and 251353) of the Academy of Finland. Publisher Copyright: © 2022 Author(s). In microelectromechanical system devices, thin films experience thermal processing at temperatures some cases exceeding the growth or deposition temperature of the film. In the case of the thin film grown by atomic layer deposition (ALD) at relatively low temperatures, post-ALD thermal processing or high device operation temperature might cause performance issues…

lämpökäsittelyjäännösjännityksetALDatomic layer depositionalumiinioksidiohutkalvotatomikerroskasvatusoptiset ominaisuudet
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