Search results for "soft lithography"
showing 4 items of 14 documents
Development of elastomeric lab-on-a-chip devices through Proton Beam Writing (PBW) based fabrication strategies
2009
Abstract In recent years, one of the most exciting developments in fluidic device applications is the rapid evolution of miniaturized micro- and nanofluidic systems, the so called “lab-on-a-chip” devices. These devices integrate laboratory functions into a single chip, and are capable of various biochemical analysis and synthesis, such as sample injection and preparation, single cell/molecule observation, bioparticle sequencing and sorting etc. The evolvement of lab-on-a-chip concept implies the use of novel fabrication techniques for the construction of versatile analytical components in a fast and reproducible manner. Endowed with unique three-dimensional fabrication abilities, Proton Bea…
New Developments in Soft Lithography
2003
Abstract The burgeoning area of soft lithography is reviewed with special emphasis on developments within the past three years. Applications in electronics have driven such developments, but more recently, other kinds of device structures and 3D prototyping have also found application, in part, through soft lithography. Microcontact printing (μCP), “lift off” μCP nano transfer printing (nTP), micromolding in capillaries (MIMIC), solvent assisted micromolding (SAMIM), replica molding (REM), and microtransfer molding are the main soft lithography schemes discussed.
Influence of MeV H+ ion beam flux on cross-linking and blister formation in PMMA resist
2012
In soft lithography, a pattern is produced in poly(dimethylsiloxane) (PDMS) elastomer by casting from a master mould. The mould can be made of poly(methylmethacrylate) (PMMA) resist by utilising either its positive or negative tone induced by an ion beam. Here we have investigated the irradiation conditions for achieving complete cross-linking and absence of blister formation in PMMA so that its negative characteristic can be used in making master moulds. PMMA thin films approximately 9 µm thick on Si were deposited by spin coating. The 2-MeV H+ ion beam was generated using a 1.7-MV tandem Tandetron accelerator. The beam was collimated to a 500×500 µm2 cross section using programmable proxi…
Patterning of supported gold monolayers via chemical lift-off lithography
2017
The supported monolayer of Au that accompanies alkanethiolate molecules removed by polymer stamps during chemical lift-off lithography is a scarcely studied hybrid material. We show that these Au–alkanethiolate layers on poly(dimethylsiloxane) (PDMS) are transparent, functional, hybrid interfaces that can be patterned over nanometer, micrometer, and millimeter length scales. Unlike other ultrathin Au films and nanoparticles, lifted-off Au–alkanethiolate thin films lack a measurable optical signature. We therefore devised fabrication, characterization, and simulation strategies by which to interrogate the nanoscale structure, chemical functionality, stoichiometry, and spectral signature of t…