0000000000011124

AUTHOR

Filimon Zacharatos

Recess photomask contact lithography and the fabrication of coupled silicon photonic and plasmonic waveguide switches

Display Omitted A lithography technique capable of printing submicron-sized features inside deep cavities is presented.A so-called recess photomask adapted to the wafer's topography is employed.Based on a standard mask aligner, Recess Photomask Contact Lithography has moderate cost.Its efficiency for a photonic/plasmonic switch application was demonstrated experimentally.The technique is extensible to any design and to wafers with multiple level recesses. A novel lithographic method is presented, based on the use of a mask aligner in the contact mode with a modified photomask, the so-called recess photomask; its goal is the printing of submicron-sized patterns into deep cavities of a chip, …

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Photo-thermal modulation of surface plasmon polariton propagation at telecommunication wavelengths

International audience; We report on photo-thermal modulation of thin film surface plasmon polaritons (SPP) excited at telecom wavelengths and traveling at a gold/air interface. By operating a modulated continuous-wave or a Q-switched nanosecond pump laser, we investigate the photo-thermally induced modulation of SPP propagation mediated by the temperature-dependent ohmic losses in the gold film. We use a fiber-to-fiber characterization set-up to measure accurately the modulation depth of the SPP signal under photo-thermal excitation. On the basis of these measurements, we extract the thermo-plasmonic coefficient of the SPP mode defined as the temperature derivative of the SPP damping const…

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Low energy routing platforms for optical interconnects using active plasmonics integrated with Silicon Photonics

Power consumption and bandwidth of electronics appear as the main set of technology barriers in next-generation Data Center and High-Performance Computing (HPC) environments. The limited capacity and pitch lane of electrically wired interconnects require the development of new disruptive technologies to cope with the massive amount of data moving across all hierarchical communication levels, namely rack-to-rack, backplane, chip-to-chip and even on-chip interconnections. Plasmonics comes indeed as a disruptive technology that enables seamless interoperability between light beams and electronic control signals through the underlying metallic layer, providing thereby an inherent energy-efficie…

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Ultracompact and Low-Power Plasmonic MZI Switch Using Cyclomer Loading

We present a $2\times 2$ hybrid silicon-plasmonic thermooptic (TO) asymmetric Mach–Zehnder interferometric (MZI) switch having only 40- $\mu \text{m}$ long active cyclomer-loaded plasmonic phase arms. It requires less than 12 mW of power and has 2/5- $\mu \text{s}$ ON/OFF-times, respectively, a modulation depth higher than 90% and a 13.2-dB extinction ratio. Data traffic evaluation has been carried out using 10-Gb/s nonreturn-to-zero streams, yielding error-free operation at both switching states with power penalties ranging between 1 to 4.8 dB. The use of the cyclomer loading having a higher TO coefficient than polymethyl methacrylate has resulted to the smallest footprint among plasmonic …

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