0000000000017640

AUTHOR

Jari Koskinen

showing 5 related works from this author

Characterization and Electrochemical Properties of Oxygenated Amorphous Carbon (a-C) Films

2016

Amorphous carbon (a-C) films with varying oxygen content were deposited by closed-field unbalanced magnetron sputtering with the aim to understand the effect of oxygen on the structural and physical properties of the films and subsequently correlate these changes with electrochemical properties. The a-C films were characterized by transmission electron microscopy, helium-ion microscopy, atomic force microscopy, Raman spectroscopy, X-ray photoelectron spectroscopy and time-of-flight elastic recoil detection analysis. The electrochemical properties were studied by electrochemical impedance spectroscopy and cyclic voltammetry with several redox systems (Ru(NH3)62+/3+, Fe(CN)64−/3−, dopamine an…

Materials scienceGeneral Chemical EngineeringInorganic chemistryAnalytical chemistrychemistry.chemical_element02 engineering and technology010402 general chemistry01 natural sciencesOxygenRedoxunbalanced magnetron sputteringElectrochemistryoxygenated amorphous carbonta114ta213021001 nanoscience & nanotechnologyAscorbic acidelectron transfercyclic voltammetry0104 chemical sciencesAmorphous solidDielectric spectroscopyCarbon filmelectrochemical impedance spectroscopyAmorphous carbonchemistryCyclic voltammetry0210 nano-technologyElectrochimica Acta
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Room-Temperature Micropillar Growth of Lithium-Titanate-Carbon Composite Structures by Self-Biased Direct Current Magnetron Sputtering for Lithium Io…

2019

Here, an unidentified type of micropillar growth is described at room temperature during conventional direct-current magnetron sputtering (DC-MS) deposition from a Li4Ti5O12+graphite sputter target under negative substrate bias and high operating pressure. These fabricated carbon-Li2O-TiO2 microstructures consisting of various Li4Ti5O12/Li2TiO3/LixTiO2 crystalline phases are demonstrated as an anode material in Li-ion microbatteries. The described micropillar fabrication method is a low-cost, substrate independent, single-step, room-temperature vacuum process utilizing a mature industrial complementary metal-oxide-semiconductor (CMOS)-compatible technology. Furthermore, tentative considerat…

Materials sciencebatteriesComposite numberchemistry.chemical_elementMaterialkemiBiomaterialschemistry.chemical_compoundSputteringElectrochemistryMaterials ChemistryGraphiteamorphous carbons; batteries; lithium titanates; microstructures; porous materialsLithium titanateDeposition (law)business.industrySputter depositionCondensed Matter Physicsamorphous carbonsElectronic Optical and Magnetic Materialschemistrylithium titanatesmicrostructuresOptoelectronicsLithiumbusinessCarbonporous materials
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Nanotribological, nanomechanical and interfacial characterization of atomic layer deposited TiO2 on a silicon substrate

2015

Abstract For every coating it is critical that the coatings are sufficiently durable to withstand practical applications and that the films adhere well enough to the substrate. In this paper the nanotribological, nanomechanical and interfacial properties of 15–100 nm thick atomic layer deposited (ALD) TiO 2 coatings deposited at 110–300 °C were studied using a novel combination of nanoscratch and scanning nanowear testing. Thin film wear increased linearly with increasing scanning nanowear load. The film deposited at 300 °C was up to 58±11 %-points more wear-resistant compared to the films deposited at lower temperatures due to higher hardness and crystallinity of the film. Amorphous/nanocr…

Materials sciencenanoindentationta221NanotechnologySubstrate (electronics)Nanomechanical characterizationengineering.materialnanomachiningAtomic layer depositionScanning nanowearCoatingMaterials ChemistryTiO2Composite materialThin filmta216ta214ta114Atomic layer depositionNanotribologySurfaces and InterfacesCondensed Matter PhysicsNanoscratchNanocrystalline materialSurfaces Coatings and FilmsAmorphous solidInterfacial characterizationthin filmsMechanics of MaterialsengineeringCrystalliteLayer (electronics)Wear
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What Determines the Electrochemical Properties of Nitrogenated Amorphous Carbon Thin Films?

2021

Funding Information: We acknowledge the provision of facilities by RawMatters Finland Infrastructure (RAMI, no. 292884), Aalto University Bioeconomy, and OtaNano - Nanomicroscopy Center (Aalto-NMC). Use of the Stanford Synchrotron Radiation Lightsource, SLAC National Accelerator Laboratory, is supported by the U.S. Department of Energy, Office of Science, Office of Basic Energy Sciences under contract no. DE-AC02-76SF00515. We acknowledge CSC – IT Center for Science, Finland, for computational resources. S.S. acknowledges funding from the Walter Ahlström Foundation. This project has received funding from the European Union’s Horizon 2020 research and innovation programme under the Marie Skł…

General Chemical EngineeringLibrary science02 engineering and technologyGeneral Chemistry010402 general chemistry021001 nanoscience & nanotechnology01 natural sciencessähkökemia0104 chemical sciencesChemical societyPolitical scienceMaterials Chemistrymedia_common.cataloged_instanceEuropean union0210 nano-technologymedia_common
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Aluminum oxide from trimethylaluminum and water by atomic layer deposition:The temperature dependence of residual stress, elastic modulus, hardness a…

2014

Use of atomic layer deposition (ALD) in microelectromechanical systems (MEMS) has increased as ALD enables conformal growth on 3-dimensional structures at relatively low temperatures. For MEMS device design and fabrication, the understanding of stress and mechanical properties such as elastic modulus, hardness and adhesion of thin film is crucial. In this work a comprehensive characterization of the stress, elastic modulus, hardness and adhesion of ALD aluminum oxide (Al2O3) films grown at 110-300 C from trimethylaluminum and water is presented. Film stress was analyzed by wafer curvature measurements, elastic modulus by nanoindentation and surface-acoustic wave measurements, hardness by na…

Materials scienceta221Residual stressAluminum oxideStress (mechanics)Atomic layer depositionEllipsometryResidual stressHardnessMaterials Chemistryta318Thin filmComposite materialta216ta116Elastic modulusta213ta114Atomic layer depositionMetals and AlloysSurfaces and InterfacesNanoindentationSurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsElastic recoil detectionAdhesionElastic modulus
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