0000000000274159
AUTHOR
Elke Erben
showing 1 related works from this author
Tuning the dielectric properties of hafnium silicate films
2007
The influence of Si concentration in hafnium silicate dielectrics on thermal stability and dielectric permittivity was analyzed. A phase diagram was developed using GIXRD and FTIR measurement. The stabilization of the ''higher-k'' cubic/tetragonal phase for annealing temperatures up to 1000^oC with a steady increase in capacitance was demonstrated for Hf"0"."9"4Si"0"."0"6O"2 films. It was also shown that the stabilization of nano-crystalline Hf"0"."8"0Si"0"."2"0O"2 films can be realized for annealing temperatures up to 900^oC. The influence of TiN electrodes on the dielectric constant and the leakage current characteristic was also investigated. A permittivity increase for annealing tempera…