0000000000274159

AUTHOR

Elke Erben

showing 1 related works from this author

Tuning the dielectric properties of hafnium silicate films

2007

The influence of Si concentration in hafnium silicate dielectrics on thermal stability and dielectric permittivity was analyzed. A phase diagram was developed using GIXRD and FTIR measurement. The stabilization of the ''higher-k'' cubic/tetragonal phase for annealing temperatures up to 1000^oC with a steady increase in capacitance was demonstrated for Hf"0"."9"4Si"0"."0"6O"2 films. It was also shown that the stabilization of nano-crystalline Hf"0"."8"0Si"0"."2"0O"2 films can be realized for annealing temperatures up to 900^oC. The influence of TiN electrodes on the dielectric constant and the leakage current characteristic was also investigated. A permittivity increase for annealing tempera…

PermittivityMaterials scienceCondensed matter physicsAnnealing (metallurgy)chemistry.chemical_elementMineralogyDielectricCondensed Matter PhysicsAtomic and Molecular Physics and OpticsSurfaces Coatings and FilmsElectronic Optical and Magnetic MaterialsHafniumTetragonal crystal systemchemistryThermal stabilityElectrical and Electronic EngineeringTinHigh-κ dielectricMicroelectronic Engineering
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