0000000000303545
AUTHOR
Liisa J. Antila
Suppression of Forward Electron Injection from Ru(dcbpy)2(NCS)2 to Nanocrystalline TiO2 Film As a Result of an Interfacial Al2O3 Barrier Layer Prepared with Atomic Layer Deposition
Subnanometer-thick Al2O3 barrier layers on nanocrystalline TiO2 film were prepared with atomic layer deposition (ALD). The method allowed variation of barrier thicknesses at atomic resolution also deep in nanoporous structures, which makes it a superior method as compared to, e.g., sol−gel techniques. In this letter we present results on the effect of Al2O3 barriers of various thicknesses on forward electron injection in dye-sensitized solar cells. A decrease in the amplitude of the oxidized Ru(dcbpy)2(NCS)2 dye absorption signal due to singlet injection was observed already after one deposition cycle that produces a discontinuous layer with nominal thickness of 1 A. More than two layer coa…
Injection and ultrafast regeneration in dye-sensitized solar cells
Injection of an electron from the excited dye molecule to the semiconductor is the initial charge separation step in dye-sensitized solar cells (DSC's). Though the dynamics of the forward injection process has been widely studied, the results reported so far are controversial, especially for complete DSC's. In this work, the electron injection in titanium dioxide (TiO2) films sensitized with ruthenium bipyridyl dyes N3 and N719 was studied both in neat solvent and in a typical iodide/triiodide (I-/I3 -) DSC electrolyte. Transient absorption (TA) spectroscopy was used to monitor both the formation of the oxidized dye and the arrival of injected electrons to the conduction band of TiO2. Emiss…
Fabrication and characterization of vacuum deposited fluorescein thin films
Simple vacuum evaporation technique for deposition of dyes on various solid surfaces has been developed. The method is compatible with conventional solvent-free nanofabrication processing enabling fabrication of nanoscale optoelectronic devices. Thin films of fluorescein were deposited on glass, fluorine-tin-oxide (FTO) coated glass with and without atomically layer deposited (ALD) nanocrystalline 20 nm thick anatase TiO2 coating. Surface topology, absorption and emission spectra of the films depends on their thickness and the material of supporting substrate. On a smooth glass surface the dye initially formes islands before merging into a uniform layer after 5 to 10 monolayers. On FTO cove…