0000000000356966

AUTHOR

Jean-yves Rauch

0000-0001-5462-1855

showing 2 related works from this author

Terpyridine-based metallopolymer thin films as active layer in ammonia sensor device

2016

International audience; A metal-containing polymer has been prepared by electropolymerization of an homoleptic Ru(II)-terpyridine complex bearing pyrrole heterocycles. The polymer is obtained as a thinfilm at the surface ofelectrodes, and has been characterized by electrochemical measurements, XPS and microscopy. It hasbeen shown that this polymer acts as an active gas sensitive layer since it enables the detection of anammonia gasflow through layer’s resistivity measurements.

[INFO.INFO-DS]Computer Science [cs]/Data Structures and Algorithms [cs.DS]Nanotechnology02 engineering and technology010402 general chemistry01 natural sciences[SPI.AUTO]Engineering Sciences [physics]/Automatic[SPI.MAT]Engineering Sciences [physics]/Materialschemistry.chemical_compoundX-ray photoelectron spectroscopyMaterials ChemistryThin filmHomoleptic[SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronicschemistry.chemical_classification[SPI.ACOU]Engineering Sciences [physics]/Acoustics [physics.class-ph]ChemistryMechanical EngineeringMetals and AlloysPolymer021001 nanoscience & nanotechnologyCondensed Matter Physics0104 chemical sciencesElectronic Optical and Magnetic MaterialsActive layerChemical engineeringMechanics of MaterialsElectrodeTerpyridine0210 nano-technology[PHYS.ASTR]Physics [physics]/Astrophysics [astro-ph]Layer (electronics)
researchProduct

Tungsten oxide thin films sputter deposited by the reactive gas pulsing process for the dodecane detection

2015

International audience; The DC reactive magnetron sputtering of a metallic tungsten target was performed in an argon + oxygen atmosphere for depositing tungsten oxide thin films. In order to control the oxygen concentration in the films, the reactive gas pulsing process, namely RGPP, was implemented. Rectangular pulses were used with a constant pulsing period T = 16 s whereas the duty cycle α (time of oxygen injection to pulsing period T ratio) was systematically changed from 0 to 100% of T. This pulsing injection of the reactive gas allowed a gradual evolution of the films composition from pure metallic to over-stoichiometric WO3+ɛ’ compounds. These WOx films were sputter deposited on comm…

[SPI.ACOU]Engineering Sciences [physics]/Acoustics [physics.class-ph][PHYS.PHYS.PHYS-OPTICS]Physics [physics]/Physics [physics]/Optics [physics.optics]ArgonMaterials scienceDodecane020502 materials[INFO.INFO-DS]Computer Science [cs]/Data Structures and Algorithms [cs.DS]Analytical chemistrychemistry.chemical_element02 engineering and technology021001 nanoscience & nanotechnologyOxygen[SPI.AUTO]Engineering Sciences [physics]/Automatic[SPI.MAT]Engineering Sciences [physics]/Materialschemistry.chemical_compound0205 materials engineeringchemistrySputteringDuty cycleDeposition (phase transition)Limiting oxygen concentrationThin film[SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics0210 nano-technology
researchProduct