0000000000371134
AUTHOR
Stephan Suckow
Bringing Plasmonics Into CMOS Photonic Foundries: Aluminum Plasmonics on Si$_{3}$N$_{4}$ for Biosensing Applications
We present a technology platform supported by a new process design kit (PDK) that integrates two types of aluminum plasmonic waveguides with Si $_{3}$ N $_{4}$ photonics towards CMOS-compatible plasmo-photonic integrated circuits for sensing applications. More specifically, we demonstrate the fabrication of aluminum slot waveguide via e-beam lithography (EBL) on top of the Si $_{3}$ N $_{4}$ waveguide and an optimized fabrication process of aluminum plasmonic stripe waveguides within a CMOS foundry using EBL. Experimental measurements revealed a propagation length of 6.2 μm for the plasmonic slot waveguide in water at 1550 nm, reporting the first ever experimental demonstration of a plasmon…
Plasmonic-assisted Mach-Zehnder Interferometric photonic sensor using aluminum waveguides
We demonstrate a CMOS compatible interferometric plasmo-photonic sensor exploiting SisN4 photonic and aluminum (Al) plasmonic stripe waveguides. Experimental evaluation revealed bulk sensitivity of 4764 nm/RIU, holding promise for ultra-sensitive and low cost sensing devices.
Plasmonic Waveguides Co-Integrated with Si3N4 Waveguide Platform for Integrated Biosensors
Integration of plasmonic waveguides with low-loss photonic platforms have attracted research efforts as the means to benefit from the extra-ordinary features of plasmonics while enhancing the functional portfolio of Photonic Integrated Circuits (PICs). In this work, we review a technology platform that integrates water cladded plasmonic waveguides integrated in a low-loss Si 3 N 4 photonic platform, targeting biosensing applications. Results obtained experimentally and numerically will be presented with respect to propagation losses, interface coupling loss and accumulated phase change per unit length, showing how Surface Plasmon Polariton (SPP) waveguides can be effectively combined with p…
Ultra-sensitive refractive index sensor using CMOS plasmonic transducers on silicon photonic interferometric platform
Optical refractive-index sensors exploiting selective co-integration of plasmonics with silicon photonics has emerged as an attractive technology for biosensing applications that can unleash unprecedented performance breakthroughs that reaps the benefits of both technologies. However, towards this direction, a major challenge remains their integration using exclusively CMOS-compatible materials. In this context, herein, we demonstrate, for the first time to our knowledge, a CMOS-compatible plasmo-photonic Mach-Zehnder-interferometer (MZI) based on aluminum and Si3N4 waveguides, exhibiting record-high bulk sensitivity of 4764 nm/RIU with clear potential to scale up the bulk sensitivity value…