0000000000386267

AUTHOR

Judith L. Macmanus-driscoll

showing 3 related works from this author

Atomic scale surface modification of TiO2 3D nano-arrays : plasma enhanced atomic layer deposition of NiO for photocatalysis

2021

Here we report the development of a new scalable and transferable plasma assisted atomic layer deposition (PEALD) process for the production of uniform, conformal and pinhole free NiO with sub-nanometre control on a commercial ALD reactor. In this work we use the readily available nickel precursor nickelocene in conjunction with O2 plasma as a co-reagent (100 W) over a temperature range of 75–325 °C. An optimised growth per cycle of 0.036 nm was obtained at 250 °C with uniform thickness and coverage on scale-up to and including an 6 inch Si wafer (with a 200 nm thermal SiO2 top layer). The bulk characteristics of the NiO thin films were comprehensively interrogated by PXRD, Raman spectrosco…

nanorakenteetvalokennotohutkalvotatomikerroskasvatusnikkeli
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Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis

2021

Here we report the development of a new scalable and transferable plasma assisted atomic layer deposition (PEALD) process for the production of uniform, conformal and pinhole free NiO with sub-nanometre control on a commercial ALD reactor. In this work we use the readily available nickel precursor nickelocene in conjunction with O2 plasma as a co-reagent (100 W) over a temperature range of 75–325 °C. An optimised growth per cycle of 0.036 nm was obtained at 250 °C with uniform thickness and coverage on scale-up to and including an 6 inch Si wafer (with a 200 nm thermal SiO2 top layer). The bulk characteristics of the NiO thin films were comprehensively interrogated by PXRD, Raman spectrosco…

Materials scienceNon-blocking I/O02 engineering and technologyPhotoelectrochemical cell010402 general chemistry021001 nanoscience & nanotechnology01 natural sciences0104 chemical sciencesAtomic layer depositionsymbols.namesakeX-ray photoelectron spectroscopyChemical engineeringChemistry (miscellaneous)symbolsGeneral Materials ScienceNanorodThin film0210 nano-technologyRaman spectroscopyLayer (electronics)Materials Advances
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Antiferromagnetism and p‐type conductivity of nonstoichiometric nickel oxide thin films

2020

Plasma‐enhanced atomic layer deposition was used to grow non‐stoichiometric nickel oxide thin films with low impurity content, high crystalline quality, and p‐type conductivity. Despite the non‐stoichiometry, the films retained the antiferromagnetic property of NiO.

Materials scienceAnalytical chemistrynickel oxide02 engineering and technologyChemical vapor depositionConductivity01 natural scienceschemical vapor depositionAtomic layer deposition0103 physical scienceslcsh:TA401-492AntiferromagnetismThin film010302 applied physicslcsh:T58.5-58.64kemialliset reaktiotkemialliset ilmiötlcsh:Information technologyNickel oxidesolution depositionatomikerroskasvatus021001 nanoscience & nanotechnologyeye diseasesthin filmsatomic layer depositionlcsh:Materials of engineering and construction. Mechanics of materialssense organsohutkalvot0210 nano-technologyInfoMat
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