0000000000445555

AUTHOR

Hermenegildo Garcı´a

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Electrochemistry nanometric patterning of MOF particles: Anisotropic metal electrodeposition in Cu/MOF

2006

Abstract Electrodeposition of copper from Cu/MOF immersed into acetate buffer produces a quasi-periodic series of 10–20 nm sized laminae sandwiched within the pristine MOF lattice as monitored by voltammetry of microparticles/atomic force microscopy. This anisotropic patterning can be qualitatively described in terms of a highly orientation-dependent diffusion of electrons and charge-balancing electrolyte counterions in the MOF network.

ChemistryInorganic chemistrychemistry.chemical_elementElectrolyteBuffer solutionElectrochemistryCopperlcsh:Chemistrychemistry.chemical_compoundlcsh:Industrial electrochemistrylcsh:QD1-999Transition metalTransmission electron microscopyElectrochemistryMetal-organic frameworkVoltammetrylcsh:TP250-261Electrochemistry Communications
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