Modification of Ce oxidation state by thermal treatments in controlled atmosphere of Ce-Ti-Eu doped SiO2 glasses

Effects of thermal treatments in controlled atmosphere on the Ce oxidation state in Ce-Ti-Eu doped SiO2 sol-gel glasses

We report an experimental study by optical absorption, photoluminescence and Raman spectroscopies of the modifications induced on Ce–Ti-Eu doped SiO2 glasses by thermal treatments in controlled atmosphere. Samples with Ce content varying up to 5,000 part per million by weight (ppm) and with Ti and Eu content fixed at 40 and 300 ppm respectively, have been investigated. The treatments were done in inert atmosphere of He and in O2 atmosphere at 390 C and 100 bar. Our experiments show that only Ce4? ions are affected by He treatments, whereas both Ce4? and Ce3? ions are affected by O2 treatments. The obtained results are interpreted on the basis of microstructural changes induced by the therma…

Near infrared emitting silica nanoparticles: O2 diffusion properties and excited state relaxation

Diffusion and outgassing of O2 in amorphous SiO2 silica nanoparticles with specific surface properties

Silica nanoparticles with hydrophilic and hydrophobic surface and average diameter of 12 and 40 nm are investigated to study the surface group influence on the diffusion process of molecular oxygen. The O2 diffusion kinetics and molecular solubility are determined by Raman/Photoluminescence measurements. Thermal treatments up to 127°C in controlled atmosphere show that the surface chemistry of nanoparticles is not changed, the equilibrium emission of O2 depends on nanoparticles surface properties, whereas the dynamics of diffusion is surface independent suggesting that surface groups could only affect overall content or detectability of interstitial molecules. The post loading outgassing in…

Properties of the O2 diffusion process in amorphous SiO2 nanoparticles

Temperature dependence of O2 singlet photoluminescence in silica nanoparticles

Effects of Pressure, Temperature, and Particles Size on O2 Diffusion Dynamics in Silica Nanoparticles

The O2 diffusion process in silica nanoparticles is experimentally studied in samples of average radius of primary particles ranging from 3.5 to 20 nm and specific surface ranging from 50 to 380 (m2/g). The investigation is done in the temperature range from 98 to 177 °C at O2 pressure ranging from 0.2 to 66 bar by measuring the interstitial O2 concentration by Raman and photoluminescence techniques. The kinetics of diffusion can be described by the Fick’s equation with an effective diffusion coefficient depending on the temperature, O2 pressure, and particles size. In particular, the dependence of the diffusion coefficient on the pressure and nanoparticles size is more pronounced at lower …

Diffusion process of molecular oxygen in silica nanoparticles