Metal–organic covalent network chemical vapor deposition for gas separation

The chemical vapor deposition (CVD) polymerization of metalloporphyrin building units is demonstrated to provide an easily up-scalable one-step method toward the deposition of a new class of dense and defect-free metal–organic covalent network (MOCN) layers. The resulting hyper-thin and flexible MOCN layers exhibit outstanding gas-separation performances for multiple gas pairs.

Gas Separation: Metal-Organic Covalent Network Chemical Vapor Deposition for Gas Separation (Adv. Mater. 34/2016)