6533b826fe1ef96bd1285211

RESEARCH PRODUCT

Metal–organic covalent network chemical vapor deposition for gas separation

Minghui WangAlberto PerrottaMariadriana CreatoreNicolas D. BoscherKatja HeinzeKaren K. Gleason

subject

Materials scienceRadical polymerization02 engineering and technologyChemical vapor deposition010402 general chemistry01 natural sciencesMetalPolymer chemistryiPECVDDeposition (phase transition)General Materials ScienceGas separationgas separationmetalloporphyrinsMechanical Engineering021001 nanoscience & nanotechnologymetal–organic covalent networks0104 chemical sciencesChemical engineeringPolymerizationMechanics of Materialsvisual_artNetwork covalent bondingvisual_art.visual_art_medium0210 nano-technologyfree-radical polymerization

description

The chemical vapor deposition (CVD) polymerization of metalloporphyrin building units is demonstrated to provide an easily up-scalable one-step method toward the deposition of a new class of dense and defect-free metal–organic covalent network (MOCN) layers. The resulting hyper-thin and flexible MOCN layers exhibit outstanding gas-separation performances for multiple gas pairs.

10.1002/adma.201601010https://doi.org/10.1002/adma.201601010