Metal–organic covalent network chemical vapor deposition for gas separation

The chemical vapor deposition (CVD) polymerization of metalloporphyrin building units is demonstrated to provide an easily up-scalable one-step method toward the deposition of a new class of dense and defect-free metal–organic covalent network (MOCN) layers. The resulting hyper-thin and flexible MOCN layers exhibit outstanding gas-separation performances for multiple gas pairs.

Gas Selective Ultrathin Organic Covalent Networks Synthesized by iPECVD: Does the Central Metal Ion Matter?

The potential of porphyrin-derived metal organic covalent networks (OCN) thin films on light gas separations has been recently demonstrated. However, whether or not the central metal ion of the porphyrin plays a key role on separation performance has yet to be elucidated. Here, one metal-free and three metal-containing (zinc(II), manganese(III), and cobalt(II)) porphyrin-derived OCN thin films are successfully deposited on various substrates via an easily scalable initiated plasma-enhanced chemical vapor deposition approach. Among these four porphyrin-derived OCN thin films exhibiting superior light gas separation performances, three of them are synthesized for the first time. The gas perme…

Gas Separation: Metal-Organic Covalent Network Chemical Vapor Deposition for Gas Separation (Adv. Mater. 34/2016)