0000000000615983

AUTHOR

Andrew J. Flewitt

showing 1 related works from this author

Antiferromagnetism and p‐type conductivity of nonstoichiometric nickel oxide thin films

2020

Plasma‐enhanced atomic layer deposition was used to grow non‐stoichiometric nickel oxide thin films with low impurity content, high crystalline quality, and p‐type conductivity. Despite the non‐stoichiometry, the films retained the antiferromagnetic property of NiO.

Materials scienceAnalytical chemistrynickel oxide02 engineering and technologyChemical vapor depositionConductivity01 natural scienceschemical vapor depositionAtomic layer deposition0103 physical scienceslcsh:TA401-492AntiferromagnetismThin film010302 applied physicslcsh:T58.5-58.64kemialliset reaktiotkemialliset ilmiötlcsh:Information technologyNickel oxidesolution depositionatomikerroskasvatus021001 nanoscience & nanotechnologyeye diseasesthin filmsatomic layer depositionlcsh:Materials of engineering and construction. Mechanics of materialssense organsohutkalvot0210 nano-technologyInfoMat
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