0000000000659703
AUTHOR
Lasma Ekimane
Applicability of a binary amplitude mask for creating correctors of higher-order ocular aberrations in a photoresistive layer
Ocular aberrations can be corrected with wavefront correctors created in a photoresist layer. The simplest type of the mask used in optical lithography is a binary amplitude mask. It is known that such a mask has a periodic hole pattern. The purpose of this research was to assess applicability of a binary amplitude mask for creating ocular wavefront correctors. The photoresist was applied to the substrate by using the dip-coating method. The photoresist layer was illuminated through a mask printed on a transparent film by using a laser printer. The surface of the wavefront correctors was evaluated by aberrometry, scanning electron microscopy and profilometry method. The dip-coating method c…
Measuring the refractive state of an eye based on the intensity of the retinal reflex
AbstractWhen examining the fundus of the eye with an ophthalmoscope, the intensity of the retinal reflex depends on the refractive state of the eye. In this study, application of this phenomenon for measuring the refractive state of the eye is demonstrated. First, a calibration curve relating the intensity of the retinal reflex and the refractive state was obtained using a model eye. Next, the intensity of the retinal reflex was measured while subjects were viewing a checker-board pattern, the distance of which was varied within the range from 0.17 to 1 m. Further, the relation between the refractive state and the optical power of the stimulus could be determined based on the measured light…