0000000000702439
AUTHOR
Guillaume Bascoul
Optical Probing (EOFM/TRI): A large set of complementary applications for ultimate VLSI
International audience; Electro Optical Techniques (EOFM: Electro Optical Frequency Mapping and EOP: Electro Optical Probing) and Dynamic Light Emission Techniques (TRE: Time Resolved Emission and TRI: Time Resolved Imaging) are dynamic optical probing techniques widely used at IC level for design debug and defect localization purpose. They can pinpoint the origin of timing issue or logic fault in up to date CMOS devices. Each technique has its advantages and its drawbacks allowing a common set of applications and more specific ones. We have been involved in the development of the most advanced techniques related to EOFM and TRI on various devices (down to 28nm technology). What we can expe…
New statistical post processing approach for precise fault and defect localization in TRI database acquired on complex VLSI
International audience; Timing issue, missing or extra state transitions or unusual consumption can be detected and localized by Time Resolved Imaging (TRI) database analysis. Although, long test pattern can challenge this process. The number of photons to process rapidly increases and the acquisition time to have a good signal over noise ratio (SNR) can be prohibitive. As a result, the tracking of the defect emission signature inside a huge database can be quite complicated. In this paper, a method based on data mining techniques is suggested to help the TRI end user to have a good idea about where to start a deeper analysis of the integrated circuit, even with such complex databases.