0000000000702439

AUTHOR

Guillaume Bascoul

showing 2 related works from this author

Optical Probing (EOFM/TRI): A large set of complementary applications for ultimate VLSI

2013

International audience; Electro Optical Techniques (EOFM: Electro Optical Frequency Mapping and EOP: Electro Optical Probing) and Dynamic Light Emission Techniques (TRE: Time Resolved Emission and TRI: Time Resolved Imaging) are dynamic optical probing techniques widely used at IC level for design debug and defect localization purpose. They can pinpoint the origin of timing issue or logic fault in up to date CMOS devices. Each technique has its advantages and its drawbacks allowing a common set of applications and more specific ones. We have been involved in the development of the most advanced techniques related to EOFM and TRI on various devices (down to 28nm technology). What we can expe…

Materials science[SPI.OPTI] Engineering Sciences [physics]/Optics / Photonic[SPI] Engineering Sciences [physics][SPI.NANO] Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronicsmedia_common.quotation_subjectComputerApplications_COMPUTERSINOTHERSYSTEMS02 engineering and technologyFault (power engineering)01 natural sciencesSet (abstract data type)[SPI]Engineering Sciences [physics]Optical frequenciesOptical probing0103 physical sciencesElectronic engineering[ SPI ] Engineering Sciences [physics][SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronicsmedia_common010302 applied physicsVery-large-scale integration021001 nanoscience & nanotechnologyCMOSDebugging[SPI.OPTI]Engineering Sciences [physics]/Optics / PhotonicLight emission[ SPI.NANO ] Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics[ SPI.OPTI ] Engineering Sciences [physics]/Optics / Photonic0210 nano-technology
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New statistical post processing approach for precise fault and defect localization in TRI database acquired on complex VLSI

2013

International audience; Timing issue, missing or extra state transitions or unusual consumption can be detected and localized by Time Resolved Imaging (TRI) database analysis. Although, long test pattern can challenge this process. The number of photons to process rapidly increases and the acquisition time to have a good signal over noise ratio (SNR) can be prohibitive. As a result, the tracking of the defect emission signature inside a huge database can be quite complicated. In this paper, a method based on data mining techniques is suggested to help the TRI end user to have a good idea about where to start a deeper analysis of the integrated circuit, even with such complex databases.

Engineering[ INFO.INFO-TS ] Computer Science [cs]/Signal and Image Processing[INFO.INFO-TS] Computer Science [cs]/Signal and Image Processing[SPI.NANO] Engineering Sciences [physics]/Micro and nanotechnologies/MicroelectronicsComputerApplications_COMPUTERSINOTHERSYSTEMS02 engineering and technologyIntegrated circuit[ SPI.SIGNAL ] Engineering Sciences [physics]/Signal and Image processingcomputer.software_genreFault (power engineering)01 natural sciencesSignalClusteringlaw.inventionFailure AnalysisDynamic Photon EmissionData acquisition[INFO.INFO-TS]Computer Science [cs]/Signal and Image Processinglaw0103 physical sciences0202 electrical engineering electronic engineering information engineering[SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/MicroelectronicsCluster analysis[SPI.SIGNAL] Engineering Sciences [physics]/Signal and Image processing010302 applied physicsVery-large-scale integrationDatabasebusiness.industryNoise (signal processing)Process (computing)VLSITime Resolved Imaging020201 artificial intelligence & image processing[ SPI.NANO ] Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronicsbusinesscomputer[SPI.SIGNAL]Engineering Sciences [physics]/Signal and Image processing
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