0000000000702501
AUTHOR
J. Rohlén
Operating a cesium sputter source in a pulsed mode
A scheme is presented for pulsing of a cesium sputter negative ion source by periodically switching on and off the high voltage driving the sputtering process. We demonstrate how the pulsed ion beam can be used in combination with a pulsed laser (6 ns pulse length) that has a 10 Hz repetition rate to study the photodetachment process, where a negative ion is neutralized due to the absorption of a photon. In such experiments, where the ion beam is used only for a small fraction of the time, we show that the pulsed mode operation can increase the lifetime of a cathode by two orders of magnitude as compared with DC operation. We also investigate how the peak ion current compares with the ion c…
Feasibility of photodetachment isobar suppression of WF with respect to HfF
Abstract The feasibility of using laser photodetachment as a means for isobar suppression in accelerator mass spectrometry has been investigated for the special case of HfF 5 − /WF 5 − . A method for absolute photodetachment cross section measurements was applied and the cross sections of tungsten pentafluoride and hafnium pentafluoride negative ions were measured. The measurements indicate that the photodetachment cross section for WF 5 − is at least 100 times larger than for HfF 5 − at the wavelength of the fourth harmonic of the Nd:YAG laser at 266 nm. The absolute cross section for WF 5 − at this photon energy was found to be (2.8 ± 0.3) × 10 −18 cm 2 , while an upper limit of 2 × 10 −…