Effect of Penetrating Irradiation on Polarization Reversal in PZT Thin Films

Spatially non-uniform imprint behavior induced by X-ray synchrotron, electron, and neutron irradiation has been investigated in Pb(Zr,Ti)O3 thin films. The obtained effects have been explained as a result of acceleration of the bulk screening process induced by irradiation. It has been shown that the spatial distribution of the internal bias field is determined by the domain pattern existing during irradiation. The microstructural changes in the structural characteristics during fatigue cycling have been revealed by high resolution synchrotron X-ray diffraction experiments. Their correlation with the evolution of the switching characteristics has been revealed and discussed.