0000000000745775
AUTHOR
F.c. Marques
ESR observations of paramagnetic centers in intrinsic hydrogenated microcrystalline silicon
Paramagnetic centers in hydrogenated microcrystalline silicon, mc-Si:H have been studied using dark and light-induced electron-spin resonance ~ESR!. In dark ESR measurements only one center is observed. The g values obtained empirically from powder-pattern line-shape simulations are gi52.0096 and g’52.0031. We suggest that this center may be due to defects in the crystalline phase. During illumination at low temperatures, an additional ESR signal appears. This signal is best described by two powder patterns indicating the presence of two centers. One center is asymmetric (gi51.999, g’51.996), while the other is characterized by large, unresolved broadening such that unique g values cannot b…
Influence of krypton atoms on the structure of amorphous hydrogenated carbon deposited by plasma enhanced chemical vapor deposition
Hydrogenated amorphous carbon (a-C:H) films were prepared by plasma enhanced chemical vapor deposition using methane (CH4 ) plus krypton (Kr) mixed atmosphere. The depositions were performed as function of the bias voltage and krypton partial pressure. The goal of this work was to study the influence of krypton gas on the physical properties of a-C:H films deposited on the cathode electrode. Krypton concentration up to 1.6 at. %, determined by Rutherford Back-Scattering, was obtained at high Kr partial pressure and bias of -120 V. The structure of the films was analyzed by means of optical transmission spectroscopy, multi-wavelength Raman scattering and Fourier Transform Infrared spectrosco…
Coefficient of thermal expansion and elastic modulus of thin films
The coefficient of thermal expansion (CTE), biaxial modulus, and stress of some amorphous semiconductors (a-Si:H, a-C:H, a-Ge:H, and a-GeCx:H) and metallic (Ag and Al) thin films were studied. The thermal expansion and the biaxial modulus were measured by the thermally induced bending technique. The stress of the metallic films, deposited by thermal evaporation (Ag and Al), is tensile, while that of the amorphous films deposited by sputtering (a-Si:H, a-Ge:H, and a-GeCx:H) and by glow discharge (a-C:H) is compressive. We observed that the coefficient of thermal expansion of the tetrahedral amorphous thin films prepared in this work, as well as that of the films reported in literature, depen…
Light induced electron spin resonance in a-Ge:H
We report the observation of light-induced electron spin resonance (LESR) in amorphous hydrogenated germanium. Two new lines with zero crossings near g=2.01 and g=2.03 were detected and ascribed to electrons and holes in the conduction- and valence-band-tail states, respectively. The ratio between the LESR spin densities of both lines is approximately one, suggesting the absence of spin pairing, charge defect creation, or LESR of dangling bonds. The growth and decay spectra exhibit dispersive behavior with a dispersion parameter ∼0.5. The decay spectrum is best fit assuming bimolecular recombination. The LESR spin density depends weakly on the photogeneration rate as a sublinear power law.