0000000000764711
AUTHOR
K.m. Golant
Absorption and luminescence in amorphous silica synthesized by low-pressure plasmachemical technology
A comparison study of as-deposited by the hydrogen-free SPCVD process silicon dioxide with and without fluorine as well as the one in the form of fused materials is performed to define whether glass forming processing affects its optical properties. Raman scattering, optical absorption in the vacuum ultraviolet region as well as luminescence at different temperatures and various excitation conditions are measured. A difference in Urbach rule parameters and intrinsic defect concentrations for different samples is revealed. No significant impact on the structure responsible for Raman scattering is observed.
Peculiarities of photoluminescence excited by 157nm wavelength F2 excimer laser in fused and unfused silicon dioxide
Abstract Photoluminescence (PL) spectra and kinetics of high purity amorphous silicon dioxide with ultra low hydroxyl content is studied under the excitation by F 2 excimer laser (157 nm wavelength) pulses. Materials synthesized in the SPCVD plasma chemical process are studied before and after fusion. Two bands are found in the PL spectra: one centered at 2.6–2.9 eV (a blue band) and the other at 4.4 eV (a UV band). Luminescence intensity of unfused material is found to increase significantly with exposure time starting from a very small level, whereas in fused counterpart it does not depend on irradiation time. Both bands show complicated decay kinetics, to which add exponential and hyperb…