6533b830fe1ef96bd1297a07
RESEARCH PRODUCT
Absorption and luminescence in amorphous silica synthesized by low-pressure plasmachemical technology
Anatoly N. TrukhinK.m. Golantsubject
PhotoluminescenceAbsorption spectroscopySilicon dioxideAnalytical chemistryCondensed Matter PhysicsElectronic Optical and Magnetic Materialschemistry.chemical_compoundsymbols.namesakechemistryMaterials ChemistryCeramics and CompositessymbolsSpectroscopyRaman spectroscopyLuminescenceAbsorption (electromagnetic radiation)Raman scatteringdescription
A comparison study of as-deposited by the hydrogen-free SPCVD process silicon dioxide with and without fluorine as well as the one in the form of fused materials is performed to define whether glass forming processing affects its optical properties. Raman scattering, optical absorption in the vacuum ultraviolet region as well as luminescence at different temperatures and various excitation conditions are measured. A difference in Urbach rule parameters and intrinsic defect concentrations for different samples is revealed. No significant impact on the structure responsible for Raman scattering is observed.
| year | journal | country | edition | language |
|---|---|---|---|---|
| 2007-04-01 | Journal of Non-Crystalline Solids |